Wash-free type allergy-relieving repair essence mask
A technology of essence and mask, applied in skin care preparations, medical preparations containing active ingredients, cosmetics, etc., can solve skin damage and other problems, achieve the effects of promoting production, relieving dryness, sensitivity and discomfort, and soothing sensitive skin
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[0038] In order to make the object, technical scheme and advantages of the present invention clearer, the embodiments of the present invention will be further described in detail below, but the embodiments of the present invention are not limited thereto, and for the process parameters or conditions not particularly indicated, reference can be made to conventional technology carried out.
[0039] The CISTUS MONSPELIENSIS extract of the present invention contains Myricetin glycosides as the main nutritional component, which protects the skin from damage caused by sunlight, accelerates epidermal renewal, and prevents free radical formation. The extract of Cistus monspeliensis (Cistus monspeliensis) in the present invention is extracted from the leaves of cistus monspeliensis of the family Rosaceae, and can be extracted by conventional methods using water, alcohol, etc. as solvents. Such as: use water as a solvent, extract 1-3 times, combine the extracts, filter, and obtain. A s...
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