Method for quickly forming oxidation film layer on surface of aluminum substrate
An oxide film layer, aluminum substrate technology, applied in surface reaction electrolytic coating, anodizing, coating and other directions, can solve the problems of complex oxidation treatment process steps, time-consuming, increasing oxide film layer, etc.
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[0016] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0017] A method for rapidly forming an oxide film layer on the surface of an aluminum substrate, comprising the following steps:
[0018] 1) For the pretreatment of the aluminum substrate, first inject half of the clean water into the cleaning tank, then slowly add the calculated amount of AC under stirring, and then replenish the water to the specified volume, then add the aluminum substrate to be cleaned into the cleaning tank for ultrasonic cleaning 2-10 minutes, after the ...
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