A manufacturing method of a three-dimensional spiral inductance device, an inductance device and a filter
A technology of inductance device and manufacturing method, which is applied in the direction of electrical solid-state devices, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems that the inductance loss is difficult to further reduce, the inductance technology cannot obtain the quality factor, etc., so as to improve performance and meet application needs , the effect of improving the quality factor
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[0028] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0029] The specific implementation of the present invention will be described in detail below in conjunction with specific embodiments.
[0030] Such as figure 1 As shown, the flow chart of the manufacturing method of the three-dimensional spiral inductance device provided by the embodiment of the present invention, the manufacturing method of the three-dimensional spiral inductance device of the present invention includes:
[0031] Step S101 , carving a capacitor lower plate on the surface of the gallium arsenide block, and setting a first silicon isolation dielectric layer on the surface of the ...
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