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Heat-resistant carbon coating

A coating and coating technology, applied in the field of improving its thermal stability, can solve the problems of fast wear and tear of this thin coating, and achieve the effect of good wear resistance and temperature resistance

Active Publication Date: 2020-02-11
NANOFILM VACUUM COATING SHANGHAI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But a common problem with existing thermal printheads is that this thin coating wears out quickly, requiring frequent replacement

Method used

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  • Heat-resistant carbon coating
  • Heat-resistant carbon coating
  • Heat-resistant carbon coating

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0129] The first example of the inventive coating (shown in Fig.1,10) was prepared as follows:

[0130]

[0131] In general, on the graphite substrate that has been sealed, magnetron sputtering deposits SiC as the primer layer, and then deposits Si in sequence according to the film thickness in the above table. 3 N 4 Then SiC. On top of these transition layers a ta-C coating was deposited using a FCVA unit.

[0132] Commercial sealants specially formulated for graphite surfaces (for example: Resbond Graphite Sealer 931S-1) are sprayed on the surface of graphite glass lens molds, and then sintered in a vacuum furnace at 1000°C to seal the substrate.

[0133] The coating of the sealed graphite substrate is prepared by using the large-scale ta-C coating equipment independently designed and manufactured by Nanfeng. First, the sealed graphite substrate is placed in the cavity of the coating equipment and then heated and evacuated in the cavity. Under vacuum, ion cleaning and...

example 2

[0136] The preparation method of the inventive coating of the second example is similar to that of the coating in Example 1, and the structure is shown in the table below.

[0137]

example 3

[0139] The coating of the thermal print head is similar to that of Example 1, and the specific structure is shown in the table below:

[0140]

[0141] Coating properties were evaluated after baking at 500°C for 2 hours at atmospheric pressure.

[0142] First, use a hundred grid knife (length adjustable 1.5mm 2 knife) to scratch the coating sample. Apply another length of 3M 610 tape to the scratched surface and peel it off. The coating was not peeled off by the tape, so the bond between the coating and the substrate was good.

[0143] In order to characterize the wear resistance of the coating, a Taber abrasion test was carried out on the coating under the following test conditions:

[0144] ·Instrument: Taber Linear Abraser TLA 5750

[0145] Abrasive: CS-17

[0146]·Test load: 1kg weight

[0147] ·Circulation speed: 60 rev / min

[0148] ·Stroke length: 25mm

[0149] After 10,000 cycles, there was no substrate exposure and no scratches were found on the coating. ...

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Abstract

The invention provides a base material that is coated with multiple layers of films, including: (a) a substrate; (b) a heat insulation layer (e.g. Si3N4); (c) a transition layer (e.g. SiC); (d) one ormore layers of films containing ta-C. The transition layercan improve the bonding force between the one or more layers of films containing ta-C and the heat insulation layer. Also, a method of preparing the coating is provided by the invention.

Description

technical field [0001] This prior invention is about a method for improving the thermal stability of carbon coatings when they are produced. Background technique [0002] There are many methods of coating on substrates. Vapor deposition is to form a thin film on a substrate, which is used in various fields, including microelectronics, super damage resistance and other applications. Vapor deposition can be divided into two categories: The first is the well known chemical vapor deposition (CVD). CVD is produced by a chemical reaction deposition process. Common CVD applications include semiconductor Si layer deposition, epitaxy, and thermal oxidation. [0003] The second type of deposition is commonly referred to as physical vapor deposition (PVD). PVD refers to the deposition of solid matter that occurs due to a physical process. PVD is the physical transfer of deposited material onto the substrate surface directly by mass transfer. Usually, no chemical reactions are invo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32C23C14/35C23C14/06C23C14/08C23C14/10
CPCC23C14/325C23C14/35C23C14/0605C23C14/0635C23C14/0652C23C14/081C23C14/10C23C14/0682C23C14/024C23C28/00C23C28/042C23C28/046C23C14/08C23C14/021C23C14/0641
Inventor 史旭
Owner NANOFILM VACUUM COATING SHANGHAI