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Preparation method of low-radiation composite film

A composite film and low-radiation technology, which is applied in the field of preparation of low-radiation composite films, can solve the problems of reduced performance, high overall thickness of the film, and influence on light transmittance, so as to reduce the overall thickness, increase light transmittance, and reduce the area. Effect

Inactive Publication Date: 2020-03-24
JIANGSU AOLAN ARCHITECTURE GLASS
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  • Abstract
  • Description
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Problems solved by technology

[0004] In the process of realizing the present invention, the inventors have found that at least the following problems have not been resolved in the prior art: 1. The overall thickness of the film is relatively high, thereby affecting its light transmittance and reducing its performance; 2. In the preparation of the Ag layer In the process, it is easy to be oxidized, which affects its relationship with TiO 2 binding rate

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  • Preparation method of low-radiation composite film

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Embodiment 1

[0025] Embodiment one: see figure 1 , the preparation method of a kind of low radiation composite film provided by the invention, comprises the following steps:

[0026] S1: Preparation of the first layer of Ti0 2 , first pump the air pressure in the vacuum chamber to 5x10 -3 Pa, preheat the radio frequency power supply for ten minutes, then pass through the working gas argon, and prepare Ti0 by radio frequency reactive magnetron sputtering 2 , Ti is used as the target, and 0 is passed through during sputtering 2 , making it react to form Ti0 2 , deposited on the substrate, during sputtering, a thin layer of TiO is formed on the surface of the target 2 , apply RF voltage on the Ti target, and prepare Ti0 by RF reactive magnetron sputtering 2 , the starting pressure of sputtering is 2Pa, the power is 300w, during the sputtering process, the pressure drops to 1Pa, the partial pressure ratio of oxygen and argon is 1:2, the height of the substrate from the target surface is 1...

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Abstract

The invention discloses a preparation method of a low-radiation composite film. The method comprises the following steps of: S1, preparing a first layer of Ti02 through radio frequency reaction magnetron sputtering, using Ti as a target material, introducing 02 during sputtering, reacting to generate Ti02, depositing on a substrate, generating a layer of TiO2 on the surface of the target during sputtering, and applying radio frequency voltage to the Ti target, S2, preparing an Ag layer by adopting a direct-current magnetron sputtering method, rotating a substrate in the preparation process, reducing the sputtering current to 0.2A, enabling the power to be 150W, reducing the sputtering power, selecting one circle of the substrate for 2 minutes, and enabling the substrate to pass through theupper part of the Ag layer five times, S3, preparing the composite film, preparing a third layer Ti02 on the Ag layer, when the third layer of Ti02 is prepared, plating a Ti layer on the Ag layer, and protecting the Ag layer through the Ti layer, wherein the preparation method of the third layer Ti02 is the same as that of S1. According to the preparation method, the Ag layer can be protected, and the thickness of the film can be reduced, so that the light transmittance is improved, and the use performance is improved.

Description

technical field [0001] The invention relates to the technical field of composite films, in particular to a preparation method of low-radiation composite films. Background technique [0002] Low-emissivity film was developed during the development of large-area glass coating. Insulating glass and vacuum glass have a certain energy-saving and heat-preserving effect because they can effectively prevent heat convection and conduction, and have widely entered people's daily production and life. But the energy-saving effect of ordinary insulating glass is only 60% 2], and the heat preservation effect is not obvious. Low-emissivity glass (low-e glass) has a large visible light transmittance and a small infrared reflection coefficient, allowing more than 80% of visible light to enter the room, and reflecting more than 90% of sunlight and infrared rays radiated by indoor objects. The energy-saving effect can reach more than 75%, and at the same time, it can meet the requirements of ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/08C23C14/50C23C14/18C23C14/16C23C14/34
CPCC23C14/0036C23C14/083C23C14/165C23C14/185C23C14/34C23C14/3407C23C14/35C23C14/505
Inventor 黄丽莎姜菊美
Owner JIANGSU AOLAN ARCHITECTURE GLASS