Preparation method of low-radiation composite film
A composite film and low-radiation technology, which is applied in the field of preparation of low-radiation composite films, can solve the problems of reduced performance, high overall thickness of the film, and influence on light transmittance, so as to reduce the overall thickness, increase light transmittance, and reduce the area. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0025] Embodiment one: see figure 1 , the preparation method of a kind of low radiation composite film provided by the invention, comprises the following steps:
[0026] S1: Preparation of the first layer of Ti0 2 , first pump the air pressure in the vacuum chamber to 5x10 -3 Pa, preheat the radio frequency power supply for ten minutes, then pass through the working gas argon, and prepare Ti0 by radio frequency reactive magnetron sputtering 2 , Ti is used as the target, and 0 is passed through during sputtering 2 , making it react to form Ti0 2 , deposited on the substrate, during sputtering, a thin layer of TiO is formed on the surface of the target 2 , apply RF voltage on the Ti target, and prepare Ti0 by RF reactive magnetron sputtering 2 , the starting pressure of sputtering is 2Pa, the power is 300w, during the sputtering process, the pressure drops to 1Pa, the partial pressure ratio of oxygen and argon is 1:2, the height of the substrate from the target surface is 1...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 
