Anti-allergy moisturizing freeze-dried mask and preparation method thereof

A technology of freeze-drying and facial mask, which is applied in the direction of pharmaceutical formulations, cosmetic preparations, dressing preparations, etc. It can solve the problems of easy failure and decomposition of active ingredients, reduce skin damage or allergies, relieve itching, and reduce heat-sensitive substances. loss effect

Inactive Publication Date: 2020-04-07
广州市玉鑫化妆品有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in a liquid environment, some active ingredients in the essence are prone to failure and decomposition, and an appropriate amount of preservatives are often added in order to keep them from deteriorating. Preservatives have certain risks to skin health.

Method used

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  • Anti-allergy moisturizing freeze-dried mask and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] A soothing moisturizing freeze-dried facial mask, based on 100 parts of total mass, added 1.2 parts of peony root extract, 2.0 parts of purslane flower / leaf / stem extract, 4.3 parts of golden chamomile extract, 0.08 part of scutellaria baicalensis extract, Add 1.0 parts of sodium hyaluronate, 0.5 parts of tremella polysaccharide, 0.8 parts of allantoin, 0.3 parts of sodium polyglutamate, 2.3 parts of fibronectin, 1.6 parts of collagen, 2.1 parts of rhamnose, and add deionized water to 100 parts.

Embodiment 2

[0031] A soothing moisturizing freeze-dried facial mask, based on 100 parts of total mass, added 1.2 parts of peony root extract, 2.5 parts of purslane flower / leaf / stem extract, 4.3 parts of golden chamomile extract, 0.08 part of scutellaria baicalensis extract, Add 1.5 parts of sodium hyaluronate, 0.5 parts of tremella polysaccharide, 1.0 part of allantoin, 0.3 parts of sodium polyglutamate, 2.3 parts of fibronectin, 2 parts of collagen, 2.1 parts of rhamnose, and add deionized water to 100 parts.

Embodiment 3

[0033] A soothing moisturizing freeze-dried mask, based on 100 parts of total mass, added 1.5 parts of peony root extract, 3.0 parts of purslane flower / leaf / stem extract, 6.0 parts of golden chamomile extract, 1.5 parts of scutellaria baicalensis extract, Add 1.5 parts of sodium hyaluronate, 0.8 parts of tremella polysaccharide, 1.0 part of allantoin, 1.0 part of sodium polyglutamate, 2.8 parts of fibronectin, 3.0 parts of collagen, 3.0 parts of rhamnose, and add deionized water to 100 parts.

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Abstract

The invention discloses an anti-allergy moisturizing freeze-dried mask. The anti-allergy moisturizing freeze-dried mask is prepared by attaching functional components to mask cloth and then freeze-drying. The functional components comprise, by mass, 1.0 to 2.0 parts paeonia lactiflora root extract, 2.0 to 5.0 parts purslane extract, 4.0 to 8.0 parts of chamomile extract, 0.05 to 3.0 parts of radixscutellariae extract, 0.5 to 3.0 parts of sodium hyaluronate, 0.2 to 1.0 part of tremella polysaccharide, 0.5 to 2.0 parts of allantoin, 0.2 to 2.0 parts of sodium polyglutamate, 2.3 to 5.1 parts offibronectin, 1.5 to 5.6 parts of collagen, 2.0 to 4.0 parts of rhamnose and the balance of deionized water. By utilizing a freeze drying technology, the problem that the activity of the components ofa traditional mask essence is easy to damage is solved, and meanwhile, no preservative is added in the freeze drying process. Irritation caused by the preservative can be reduced. In addition, the mask has the effects of relieving, resisting allergy, diminishing inflammation, resisting bacteria, efficiently moisturizing, repairing skin and resisting aging.

Description

technical field [0001] The invention relates to the technical field of daily cosmetics, in particular to a soothing and moisturizing freeze-dried facial mask and a preparation method thereof. Background technique [0002] With the extensive development and application of skin care products, sensitive skin has attracted more and more attention. Facial skin allergies and redness are a major manifestation of skin allergies, and facial masks have the characteristics of wide and uniform coverage. Therefore, facial masks are used as a soothing anti-inflammatory Sensitive product carrier is a better choice to solve facial skin allergies. Mask is one of the widely used daily skin care products. Traditional mask is to pour the dissolved and prepared essence into the membrane bag with membrane cloth to make it adsorb on the membrane cloth. However, in a liquid environment, some active ingredients in the essence are prone to failure and decomposition, and an appropriate amount of pres...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K8/88A61K8/73A61K8/65A61K8/64A61K8/60A61K8/02A61K8/49A61Q19/00
CPCA61K8/9789A61K8/735A61K8/73A61K8/88A61K8/65A61K8/64A61K8/60A61K8/4946A61K8/0212A61Q19/00A61Q19/005A61K2800/84
Inventor 苏焕鑫林泽森黄勇付国海莫贤东
Owner 广州市玉鑫化妆品有限公司
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