Manufacturing method of single-layer TCTS relaxation-resistant coating in alkali metal gas chamber

Abstract

The invention discloses a manufacturing method of a single-layer TCTS relaxation-resistant coating in an alkali metal gas chamber. A TCTS solution and an alkali metal gas chamber subjected to hydroxylation treatment are placed in a heated state, the alkali metal gas chamber is filled with the TCTS solution by utilizing a peristaltic pump, and TCTS molecules in the TCTS solution and hydroxyl groupson the inner wall of the gas chamber undergo a dehydration condensation reaction to form a TCTS coating bonded to the inner wall of the gas chamber through silicon-oxygen bonds, so the application ofthe coating at a high temperature, such as an SERF magnetometer, is favorably ensured, the application field of the relaxation-resistant coating is widened; the formed coating is thicker due to longer TCTS molecular chain, and the relaxation-resistant performance of the alkali metal gas chamber can be met and even improved even through the single-layer TCTS coating is adopted. The TCTS is triacontyl trichlorosilane.

Description

technical field [0001] The invention relates to the production technology of an anti-relaxation coating on the inner wall of an alkali metal gas chamber, in particular to a method for manufacturing a single-layer TCTS anti-relaxation coating in an alkali metal gas chamber. They are all placed in a heated state, and the alkali metal air chamber is filled with the TCTS solution by using a peristaltic pump. The TCTS molecules in the TCTS solution and the hydroxyl groups on the inner wall of the air are formed by dehydration condensation reaction and bonded to the alkali metal air chamber through a silicon-oxygen bond. The TCTS coating on the inner wall of the gas chamber is beneficial to ensure the application of the coating at a higher temperature, such as SERF magnetometer, etc., which broadens the application field of the anti-relaxation coating. The coating thickness is greater, even a single-layer TCTS coating can meet or even improve the anti-relaxation performance of the a...

AI Technical Summary

Problems solved by technology

[0002] With the continuous expansion of the application field of alkali metal gas cells, the anti-relaxation coating has greater advantages than the buffer gas. However, there are currently two main factors that limit the wide application of the anti-relaxation coating. One is high temperature resistance. The production of anti-relaxation coatings, such as octadecyltrichlorosilane (OTS) coatings, etc., has poor anti-relaxation performance and poor consistency of coating production

Second, coatings with strong anti-relaxation properties, such as olefins and paraffins, have low operating temperatures and narrow application ranges

At present, the production of TCTS coatings is carried out on glass or silicon wafers. TCTS is solid at room temperature, and its melting point is as high as 82°C. It is difficult to produce TCTS anti-relaxation coatings inside the gas chamber, and The formation of a single-layer TCTS coating needs to be in a nitrogen or anhydrous environment, which further increases the production of a single-layer TCTS coating in an alkali metal gas chamber

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