Micron-sized pore deslagging method for epoxy substrate
An epoxy substrate, micron-level technology, applied in the processing of insulating substrates/layers, electrical components, printed circuit manufacturing, etc., can solve the problems of high production cost, inability to recycle the treatment liquid, not environmentally friendly, and long process. The effect of short process, low energy consumption in normal temperature operation, and simple ingredients
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[0022] The following description is merely exemplary in nature and not intended to limit the disclosure, application or use. The specific implementation of the method for removing slag from micron-sized pores on epoxy substrates of the present invention will be further described below.
[0023] The present invention proposes a method for removing slag from micron-sized pores on an epoxy substrate, comprising the following steps:
[0024] 1. Configure the slag removal solution:
[0025] (1) Weigh the frosting powder with a particle size of D50=0.2mm, add it to DMI (1,3-dimethyl-2-imidazolinone) solvent, and make the first frosting powder with a solid content of 0.5%. slag;
[0026] (2) The second slag removal liquid is prepared from oxalic acid, hydrogen peroxide, and ethanol, with a pH range of 2, a hydrogen peroxide volume content of 5%, and an ethanol volume content of 30%.
[0027] 2. Specific operation process:
[0028] (1) Select 10 FR4 substrates after drilling, chec...
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