CNT-IGZO thin film heterojunction bipolar transistor and preparation method and application thereof
A heterojunction bipolar and transistor technology, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of large contact resistance, poor performance, and low mobility, so as to improve electrical performance and achieve large The effect of area array and large application prospect
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[0033] RF magnetron sputtering sputtering power is 50-150W, the ratio of argon to oxygen is 12:1, sputtering gas is 0.6-0.75Pa, prepare 20nm IGZO active layer, and anneal at 300℃ for 1 hour in oxygen atmosphere . On the preparation of the IGZO semiconductor active layer, drop-coat the high-purity semiconductor-type carbon nanotube solution. The specific process includes, using ultraviolet lithography technology to expose the electrode pattern on the IGZO film, and finally patterning it through the developer; on the patterned substrate Conduct electron beam evaporation, first evaporate 5nm titanium as the adhesion layer, then evaporate 30nm gold as the source electrode and drain electrode, after the evaporation is completed, remove the glue to obtain a patterned metal electrode array; spin-coat PMMA glue, at 500rpm Spin coating at 3000rpm for 5s, then spin coating at 3000rpm for 60s, and obtain the pattern of the channel by developing, then drop-coat CNT solution, and get it af...
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