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Application and using method of MoS2-ZnO heterostructure serving as reversible light-controlled wetting material

A mos2-zno, 1.mos2-zno technology, applied in metal material coating process, superimposed layer plating, ion implantation plating and other directions, can solve problems such as limited development and long light response time

Active Publication Date: 2020-05-12
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the wettability of ZnO itself changes relatively little before and after light, and the photoresponse time is relatively long. Most studies have found that the wettability of ZnO will change greatly after 2 hours of UV irradiation, and it must be stored in the dark for a long time before it can return. to the hydrophobic state, in practical applications, the switch can only be performed in one direction, which greatly limits its further development

Method used

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  • Application and using method of MoS2-ZnO heterostructure serving as reversible light-controlled wetting material
  • Application and using method of MoS2-ZnO heterostructure serving as reversible light-controlled wetting material
  • Application and using method of MoS2-ZnO heterostructure serving as reversible light-controlled wetting material

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Experimental program
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preparation example Construction

[0033] MoS 2 -The preparation method of the ZnO heterostructure may comprise the following steps:

[0034] S10, providing a substrate and forming MoS on the substrate 2 layer;

[0035] S20, in the MoS 2 A ZnO layer is formed on the layer.

[0036] Step S10 forming the MoS 2 The layering method may include at least one of metal organic chemical vapor deposition, magnetron sputtering, molecular beam epitaxy, chemical vapor deposition, and wet transfer.

[0037] In one embodiment, step S20 forms the MoS 2 Layer method is chemical vapor deposition, the chemical vapor deposition MoS 2 Layer steps include:

[0038] Provide molybdenum source, sulfur source, and growth carrier gas, place the molybdenum source, the sulfur source, and the substrate in a dual-temperature zone tube furnace to feed the growth carrier, and the molybdenum source is at a pressure of 3000Pa to 4000Pa , treatment at 600°C to 700°C for 8 minutes to 12 minutes, the sulfur source at 3000Pa to 4000Pa pressu...

Embodiment

[0048] (1) Ultrasonic cleaning of Si / SiO with acetone, ethanol, ultrapure water and other reagents 2 The substrates were dried for 15 minutes each and blown dry with nitrogen to obtain a clean substrate surface.

[0049] (2) Using MoO separately 3 (99.999% purity) and solid sulfur (99.999% purity) as the source of molybdenum and sulfur, argon as the growth carrier gas, the substrate, MoO 3 , Solid sulfur is placed in a tube furnace with a diameter of 80mm and a double temperature zone, using a pressure of 4000Pa, MoO 3 The temperature zone where it is located is raised to 650 degrees, and the temperature zone where solid sulfur is located is raised to 180 degrees, and grown for 10 minutes to obtain a single layer of MoS 2 layer.

[0050] (3) Using the MSP-3200T magnetron sputtering coating machine in the prepared single-layer MoS 2 A 50nm thick ZnO film is deposited on the surface by magnetron sputtering coating process. ZnO crystal was used as the target material, the sp...

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Abstract

The invention relates to application of a MoS2-ZnO heterostructure serving as a reversible light-controlled wetting material. The MoS2-ZnO heterostructure comprises a substrate, a MoS2 layer located on the substrate, and a ZnO layer located on the MoS2 layer. The invention further relates to a using method of the MoS2-ZnO heterostructure serving as the reversible light-controlled wetting material.

Description

technical field [0001] The invention relates to the technical field of functional materials, in particular to a MoS 2 -Use and method of ZnO heterostructure as reversible light control wettability material. Background technique [0002] Since the 21st century, the integration of surface and interface science, bionics, and multidisciplinary research has become a research hotspot, which has greatly promoted the emergence of new superhydrophobic materials. Superhydrophobic material technology is a multidisciplinary interdisciplinary technology involving materials, physics, chemistry and biology. At present, obtaining a single property of superhydrophobicity can no longer meet the requirements of technological development, but more pursuit of multi-response, adjustable intelligence, etc. Many scholars at home and abroad have studied the preparation and characteristics of surfaces with controllable wetting properties under different external stimuli such as light, heat, electri...

Claims

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Application Information

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IPC IPC(8): C23C28/04C23C16/30C23C14/35C23C14/08
CPCC23C14/086C23C14/35C23C16/305C23C28/04
Inventor 马丽然马平素
Owner TSINGHUA UNIV