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560 results about "De wetting" patented technology

Hydrophilic and hydrophobic composite wetting microstructure steam cavity and manufacturing method thereof

The invention provides a hydrophilic and hydrophobic composite wetting microstructure steam cavity and a manufacturing method thereof, and relates to the technical field of heat dissipation devices. The hydrophilic and hydrophobic composite wetting microstructure steam cavity comprises an evaporation end and a condensation end, the surface of the evaporation end comprises a micro-channel hydrophilic area and a micro-array hydrophilic area, and the micro-channel hydrophilic area surrounds the micro-array hydrophilic area; the surface of the condensation end comprises condensation hydrophilic areas and condensation hydrophobic areas which are distributed at intervals, and the evaporation end and the condensation end are assembled to form a flat plate structure with a cavity in the middle. Different wettability surfaces of the condensation hydrophilic area and the condensation hydrophobic area are compounded, rapid nucleation condensation can be achieved, droplet-shaped condensation heat transfer of rapid falling of liquid drops in the condensation hydrophobic area and capillary suction rapid liquid discharge of the micro-channel hydrophilic area at the evaporation end are combined, condensation heat transfer of a working medium is enhanced, liquid backflow circulation is accelerated, and the condensation efficiency is improved. The temperature uniformity of the hydrophilic and hydrophobic composite wetting microstructure steam cavity is greatly improved, and batch forming of large-area microstructure functional surfaces is achieved through the in-situ heating imprinting forming micro-imprinting technology.
Owner:HARBIN INST OF TECH

Small tower footing alkali polishing additive suitable for high back contact of TOPCon battery and use method of small tower footing alkali polishing additive

The invention discloses a small tower footing alkali polishing additive suitable for high back contact of a TOPCon battery and a use method of the small tower footing alkali polishing additive, and relates to the technical field of monocrystalline silicon polishing. Comprising the following components: a corrosion catalyst, a multi-carboxyl polymer, a high-wetting defoaming agent, a surfactant, a chelating agent, a protective agent, hyperbranched polylysine, tannic acid, quinoline yellow, caffeine, 3-(N-morpholinyl)-2-sodium hydroxypropanesulfonate and deionized water. The alkali polishing additive is good in polishing effect under the condition of low weight loss, a relatively rough small-size tower footing can be formed on the back face of a silicon wafer after alkali polishing, and the cell conversion efficiency is gained.
Owner:JIAXING XIAOCHEN PHOTOVOLTAIC TECH CO LTD

System and method for regulating and controlling metal wetting behavior in vacuum brazing process

The invention relates to the technical field of brazing, in particular to a metal wetting behavior regulation and control system and method in the vacuum brazing process. The pretreated hard alloy, the pretreated base body and the pretreated mixed brazing filler metal are loaded into a vacuum brazing furnace, a heating and temperature control system is started, and heating is conducted according to a preset heating curve; in the heating process, according to a feedback result monitored in real time, the wetting behavior of the brazing filler metal is regulated and controlled; and the heating system is closed, so that the brazed part is naturally cooled in the vacuum environment. The hard alloy and the substrate are subjected to surface pretreatment, so that surface oxides, oil stains and other impurities are effectively removed, the wettability of the surface of the substrate is improved, and favorable conditions are provided for uniform wetting of the brazing filler metal. And a proper amount of active elements are added into the prepared mixed brazing filler metal, so that the wettability of the brazing filler metal on the hard alloy is improved. Therefore, the problem that metal wetting is not uniform in the traditional vacuum brazing process is solved.
Owner:同济大学浙江学院

Method for predicting wettability of narrow-gap swing laser welding pool based on CFD simulation

The invention provides a narrow gap swing laser welding pool wettability prediction method based on CFD simulation. The method comprises the following steps that an interaction platform is constructed through Python + PyQt5, and geometric modeling, UDF compiling and a material library module are integrated; the groove parameters and the swing track are dynamically loaded to a Fluent solver, and a full-coupling transient model of a steam recoil pressure-buoyancy-molten drop mass source item is established; in CFD-POST, the widest section of the molten pool is positioned on the basis of the contour surface with the volume fraction being 0.5, and Z-direction displacement-flow velocity data are extracted along the two side wall surfaces; fusing defects are predicted through double criteria of a bilateral average flow velocity difference threshold value and F test variance homogeneity; according to the method, dynamic quantitative evaluation of wetting behaviors can be achieved, the process development period is shortened, the defect detection rate is increased, and the method is suitable for aerospace thick plate welding quality control.
Owner:CHINA UNIV OF MINING & TECH +3

Method for solving zinc powder removal problem of galvanized fingerprint-resistant plate stamping television backboard part

The invention discloses a method for removing zinc powder from a galvanized fingerprint-resistant plate stamped television backboard part, which is characterized in that a fingerprint-resistant passivation film on the surface of strip steel is fully dried and cured by controlling the drying temperature of a post-treatment tower after the galvanized fingerprint-resistant plate is passivated, the dyne value is greater than 40, the surface wetting effect is better, and the anti-dezincification effect is better. And meanwhile, a good lubricating effect (low dynamic friction coefficient) is achieved, the surface roughness (Ra) of the finished strip steel is controlled to be 0.80-1.40 microns, and the phenomenon of zinc powder removal in the stamping process can be effectively avoided.
Owner:BAOTOU IRON & STEEL (GROUP) CO LTD

Method for joining, by direct brazing, a first part and a second part, including steps of preparing the surface of at least one of the parts

A method for joining, by brazing, a first part and a second part, the steps of preparing at least one of the parts including the following: a) providing a part intended to be brazed, the part being made of carbon or based on titanium, nickel or a CoCr alloy, b) performing inert gas plasma treatment on the part whereby the part is cleaned and an active surface is formed on the part, c) depositing a first layer comprising an active element on the active surface of the part, the active element being a carbide-forming element, d) depositing a second layer of gold on the first layer, whereby the first layer is protected from oxidation and good wetting is ensured.
Owner:COMMISSARIAT A LENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

Efficient wetting production equipment for wetting and powdering architectural ceramics

The efficient wetting production equipment comprises an elevator, an outlet of the elevator is communicated with a powder storage bin, the bottom of the powder storage bin is communicated with a powder supply dispersion component, the powder supply dispersion component is communicated with the top of a wetting tower body, the wetting tower body is matched with a water supply system, and a constant-pressure dust removal chamber is arranged at the bottom of the wetting tower body; the constant-pressure dust removal chamber is communicated with the dust remover, the dust remover is communicated with an air flow groove of the elevator, a first conveyor is installed at the bottom of the wetting tower body, the output end of the first conveyor is detachably connected with the drum screen device, a second conveyor is arranged at an output port of the drum screen device, and the output end of the second conveyor is communicated with the powder waking bin. And an output end arranged at the bottom of the powder waking bin is matched and connected with the fourth conveyor. By adjusting the number of the powder supply dispersion components, the water supply amount of the water supply system, the dust removal power of the dust remover and the diameter of the wetting tower body, a feasible scheme can be formulated for production lines with different powder production amount requirements under the condition that the good wetting powder production effect is guaranteed.
Owner:河北金汇陶瓷有限公司 +1

Strong-adsorption super-wetting self-assembly micromolecule as well as preparation method and application thereof

The invention discloses a strong-adsorption super-wetting self-assembled micromolecule and a preparation method and application thereof.The substituent groups of the self-assembled micromolecule are two arylphosphonic acids, meanwhile, the acidic N-H group of carbazole is kept unchanged, bisphosphonate anchoring shows enhanced adsorption capacity and efficient hole extraction / transmission, and the self-assembled micromolecule has the advantages that the self-assembled micromolecule is high in adsorption capacity and high in hole extraction / transmission efficiency; a reverse substituted carbazole ring contributes to a super-wetting bottom layer of perovskite, and meanwhile, compared with a small molecule of monoaryl phosphonic acid, the molecule has higher stability under long-time illumination. The strong-adsorption super-wetting self-assembly micromolecule disclosed by the invention is simple in synthesis step, low in preparation cost, high in yield and capable of realizing large-scale synthesis. By adopting the formula I as the hole transport layer of the p-i-n type perovskite solar cell, a firmly adsorbed super-infiltration self-assembly single layer can be prepared, so that a high-quality perovskite thin film is realized and energy mismatch is reduced, and the efficiency and the stability of a perovskite single cell and a laminated cell are remarkably improved.
Owner:XIAMEN ZHONGKE YANYANG NEW MATERIALS CO LTD

Electroplating wetting chamber with reduced bubble entrapment

Method and systems for cleaning and wetting a semiconductor substrate, are provided. Methods and systems include forming an atmosphere in a basin housing the semiconductor substrate with a gas having a higher solubility in a wetting agent than oxygen. Methods and systems include spraying the wetting agent with a spray head onto the substrate while maintaining the atmosphere. Methods and systems include rotationally translating the semiconductor substrate, the spray head, or both the semiconductor substrate and the spray head, Methods and systems include wetting a plurality of features defined in the substrate.
Owner:APPLIED MATERIALS INC

UV photocureable coating as well as preparation method and application thereof

The invention relates to the technical field of coatings, and discloses a UV photocureable coating as well as a preparation method and application thereof. The UV photocureable coating comprises the following components in percentage by weight based on the total weight of 100%: 65-85% of urethane acrylate; 0.1%-1% of a wetting leveling agent; 0.1%-1% of a defoaming agent; 0.1%-1% of a thickening agent; 10%-35% of water; wherein the urethane acrylate contains a photo-initiation structural unit. According to the invention, polyurethane acrylate with a self-initiation characteristic is selected as a main film-forming substance of the UV photocureable coating, and no additional photoinitiator is added in the formula. By adding auxiliary components such as a wetting leveling agent, a defoaming agent and a thickening agent, the water-based UV photocureable coating with low odor and low discoloration characteristics after UV curing is prepared.
Owner:PUYANG ZHANCHEN NEW MATERIALS CO LTD

Liquid metal-based tilt angle sensor with wettability regulated and controlled by graphite, preparation method and application

The invention relates to a liquid metal tilt angle sensor with wettability regulated and controlled by graphite, which comprises a flexible polymer matrix, a liquid metal layer and a graphite layer, the graphite coating covers part of the surface of the inner wall of the micro-channel and is used for regulating and controlling the wettability of the inner wall; and the liquid metal is filled in the micro-channel and forms an axially continuous gradient section fluid. According to the method, the wettability of the inner wall to the liquid metal is regulated and controlled by coating the inner wall of the smooth flexible polymer micro-channel with graphite (and regulating the proportion of the coating area) by utilizing the characteristic that a graphite material is not wetted to the liquid metal. And by utilizing the surface oxidation film characteristic and high fluidity of the liquid metal, a liquid metal gradient section with instability can be formed in the pipeline. When the pipeline is inclined, the state (such as contact area or form) of the liquid metal surface can be changed under the action of gravity, so that the resistance of the liquid metal surface is influenced, and accurate angle detection can be realized.
Owner:ZHONGKE GUANGDIAN (BEIJING) SCI & TECH CO LTD +1

Method for vertically interconnecting wafers

The invention relates to the technical field of microelectronic manufacturing, and discloses a method for vertically interconnecting wafers. The method comprises the following steps: etching a through hole in a wafer; performing wet cleaning on the wafer, and sequentially arranging a medium protection layer and a diffusion barrier layer on the outer side wall of the wafer and the inner side wall of the through hole; depositing an adhesive layer on the first side of the wafer, and depositing a metal seed layer on the adhesive layer; electroplating a metal layer on the metal seed layer and the end part of the through hole; pre-wetting the through hole on a second side opposite to the first side of the wafer; and the through hole is filled with electroplating metal on the second side of the wafer. The problem of metal filling in manufacturing of the vertical interconnection wafer with the high aspect ratio of 10: 1 or above is solved, the difficulty of electroplating metal filling is greatly reduced, and the achieved vertical interconnection wafer has the advantages of being simple in production process, high in production efficiency, few in metal filling defect, short in interconnection delay time and the like.
Owner:BEIJING SELEX INTERNATIONAL TECHNOLOGY CO LTD

Double-probe zero-value insulation identification method considering surface wetting state of insulator

The invention provides a double-probe zero-value insulation identification method considering an insulator surface wetting state, and relates to the technical field of power transmission line state detection. The method comprises the steps that S1, two electric field probes are arranged on the surface of an umbrella skirt of an insulator at intervals in the axial direction, and the electric field intensities output by the two electric field probes are marked as E1 and E2 respectively; s2, calculating a deviation rate eta based on the electric field intensities output by the two electric field probes; s3, detecting a surface wetting index W of the insulator; s4, correcting the surface wetting index W to obtain a correction coefficient Kwet; s5, modifying the criterion of the zero value state into eta < lt >; and the zero value state is recognized according to the set threshold value Eta0. Kwet, and Eta0 is a fixed threshold value. According to the method, the accuracy of insulator zero value state recognition can be kept in multiple environment scenes such as rain, fog and moisture, and high robustness and high adaptability are improved for intelligent routing inspection and zero value defect recognition of a power transmission line.
Owner:国网西藏电力有限公司电力科学研究院

A method for preparing Janus ceramic membranes based on pre-wetting control

This invention belongs to the field of membrane material preparation and modification technology, and relates to a method for pre-wetting the surface of a hydrophobic ceramic membrane. The ceramic membrane is immersed in a cyclohexane solution of perfluorooctyltrimethoxysilane for 3-4 hours. After immersion, the ceramic membrane is dried in an oven. An ethanol solution is forced to circulate through the ceramic membrane to pre-wet the separation layer. The pre-wetting process proposed in this invention is simple, highly controllable, and easily scaled up to pre-wet multi-channel hydrophobic ceramic membranes. This invention achieves coarse adjustment of the wetting degree by controlling the concentration of the ethanol-water solution, and further fine adjustment by combining the circulation time of the ethanol-water solution, thus achieving more precise control of the wetting degree and optimal improvement of the uniformity of the hydrophilic coating.
Owner:NANJING TECH UNIV

Preparation method of Joule heat-assisted super-wetting metal net, metal net with super-hydrophilic performance and metal net with super-hydrophobic performance

The invention provides a preparation method of a Joule heat-assisted super-wetting metal net, a metal net with super-hydrophilic performance and a metal net with super-hydrophobic performance. According to the material, carbon nanotubes are firmly adhered to the surface of a metal net through polydopamine mediation to construct a micro-nano coarse structure, a hydrophobic alkyl compound is grafted through a sulfenyl three-component coupling reaction to reduce surface energy, and a super-hydrophilic / underwater super-oleophobic metal net and a super-hydrophobic metal net are prepared respectively. The Joule heating effect of the material is remarkably enhanced by introducing the carbon nanotubes, so that the temperature of the material can be rapidly increased to 100 DEG C or above within 20 seconds under the ultralow voltage of 2.0 V. The characteristic can be effectively used for in-situ heating viscosity reduction of high-viscosity crude oil, continuous and efficient oil-water separation is achieved in a double-channel separation device, the crude oil flux reaches up to about 3985 L.m <-2 >. H <-1 >, and the separation efficiency exceeds 98.6%. The method is also suitable for stainless steel meshes with micron-sized apertures, and can realize efficient separation of various crude oil emulsions.
Owner:XINJIANG TECH INST OF PHYSICS & CHEM CHINESE ACAD OF SCI +1

Double-curved-surface non-uniform wetting micro-nano structure for strengthening boiling / evaporation heat transfer and manufacturing method and application of double-curved-surface non-uniform wetting micro-nano structure

The invention discloses a double-curved-surface non-uniform wetting micro-nano structure for strengthening boiling / evaporation heat transfer and a manufacturing method and application, and belongs to the technical field of heat transfer. The structure comprises a substrate and a double-curved-surface three-dimensional super-hydrophilic micro-nano structure array; the substrate has hydrophobicity / super-hydrophobicity; the array is composed of a plurality of upwards-convex hyperboloid three-dimensional super-hydrophilic micro-nano structures. The hyperboloid three-dimensional super-hydrophilic micro-nano structure comprises a convex main body and a top concave cavity; and the side wall of the convex main body and the inner wall of the concave cavity at the top are curved surface structures and are full of super-hydrophilic micro-nano porous structures. The transverse growth space of bubbles generated by boiling is restrained, expansion and combination of the bubbles generated by boiling are restrained, nucleation and separation of the bubbles in a super-hydrophobic area are promoted, the water storage capacity can be increased through a top catenary face, boiling / evaporation liquid supply is enhanced, capillary liquid supply is promoted, and the heat transfer coefficient is increased through combination of a hyperboloid mixed super-wetting three-dimensional structure; and the heat transfer limit is improved by means of the double-curved-surface three-dimensional curved surface pinning effect under the ultrahigh superheat degree by adhering liquid film boiling.
Owner:NANJING UNIV OF AERONAUTICS & ASTRONAUTICS

Water-based flame-retardant aerogel coating as well as preparation method and application thereof

The invention discloses a water-based flame-retardant aerogel coating and a preparation method and application thereof, and the water-based flame-retardant aerogel coating comprises the following components in parts by weight: 25-35 parts of a water-based resin emulsion, 5-10 parts of aerogel powder, 30-50 parts of a flame retardant, 2-8 parts of a filler, 2-10 parts of hollow glass beads, 0.2-1 part of a wetting dispersant, 10-15 parts of water and 1-3 parts of a defoaming agent. 0.5-1 part of an emulsifier, 1-2 parts of a stabilizer and 0.1-0.5 part of a leveling agent. According to the water-based flame-retardant aerogel coating disclosed by the invention, the high flame-retardant property of the coating can be considered while high heat insulation and heat preservation effects are realized, the flame-retardant property meets UL94V0 and VTM-0 standards, and the water-based flame-retardant aerogel coating is widely applied to industries with flame-retardant requirements due to the excellent flame-retardant property.
Owner:SHENZHEN DEYIMENG ELECTRONICS CO LTD

Electroplating device and using method thereof

According to the electroplating device and the using method thereof, through cooperation of the wafer carrier and the auxiliary device, flexible moving and positioning of the spraying tank are achieved through the telescopic connecting piece, before electroplating, the auxiliary device can wet the surface of a wafer in advance, air in Via and Trench can be effectively removed, it is ensured that electroplating liquid is fully filled, and poor plating and hole generation are avoided; after electroplating, the auxiliary device can quickly clean the residual electroplating liquid on the surface of the wafer and collect the cleaning liquid to prevent the cleaning liquid from being introduced into the electroplating bath to interfere with the concentration of the additive; meanwhile, upwelling electroplating liquid steam can be shielded, and film forming defects caused by contact reaction of the upwelling electroplating liquid steam and the wafer are avoided; in addition, during electroplating, the auxiliary device can rotate to the outer side of the electroplating bath and conduct cleaning liquid discharging operation, normal electroplating steps are not affected, and the stability and efficiency of the electroplating process are improved.
Owner:CHONGQING XINLIAN MICROELECTRONICS CO LTD

Zero-VOC (volatile organic compound) water-based emulsion coating applied to container maintenance and preparation method thereof

The invention discloses a zero-VOC (volatile organic compound) water-based emulsion coating applied to container maintenance and a preparation method thereof. The coating is prepared from the following components in parts by weight: 50 to 60 parts of water-based hybrid emulsion, 1 to 3 parts of coalescing agent, 0.5 to 1 part of wetting dispersant, 0.2 to 0.4 part of defoaming agent, 0.5 to 1 part of adhesion promoter, 0.3 to 0.5 part of thickening agent, 10 to 20 parts of pigment, 3 to 5 parts of anti-rust pigment, 0.5 to 1 part of corrosion inhibitor, 0.2 to 0.4 part of base material wetting agent and 15 to 26 parts of deionized water. Wherein the water-based hybrid emulsion is a water-based single-component acrylic acid epoxy hybrid emulsion, and the coalescing agent is an alcohol ether compound. Under the condition of zero VOC, high performance of the coating is kept, and the coating has the advantages of being high in drying speed, good in salt spray resistance and weather resistance, free of VOC and the like.
Owner:COSCO KANSAI PAINT SHANGHAI CO LTD

High-hydrophobicity liquid lead bismuth alloy nitride coating capable of increasing high-temperature contact angle and preparation method of high-hydrophobicity liquid lead bismuth alloy nitride coating

The invention discloses a preparation method of a high-hydrophobicity liquid lead bismuth alloy nitride coating capable of increasing a high-temperature contact angle, which comprises the following steps of: pretreating a substrate, depositing a FeCrAl coating on the surface of the substrate by adopting magnetron sputtering, and nitriding the FeCrAl coating to obtain a nitride coating; the invention further discloses the high-hydrophobicity liquid lead bismuth alloy nitride coating for improving the high-temperature contact angle. According to the preparation method, the FeCrAl coating is nitrided, so that the surface strength and corrosion resistance of the FeCrAl coating are improved, the formed FeCrAl nitride layer with a compact structure has high lyophobicity on the liquid lead bismuth alloy, the material surface is in a non-wetting state all the time, the liquid lead bismuth alloy can be effectively prevented from permeating into an alloy matrix, and the service life of the material is prolonged. The material is suitable for being used as a cladding material of a lead-cooled fast neutron reactor.
Owner:NORTHWEST INSTITUTE FOR NONFERROUS METAL RESEARCH

Determining a start-up operation mode of a wetting system of a cleaning device

A cleaning device for cleaning a surface is described. The cleaning device includes at least one cleaning element and a wetting system to supply a cleaning liquid to the at least one cleaning element. The wetting system is operable in one of at least one normal operation mode and a boost operation mode involving an increased supply rate of the cleaning liquid with respect to the at least one normal operation mode. During start-up of the cleaning device in a wet cleaning mode thereof, a start-up operation mode of the wetting system is determined to be one of the normal operation mode or the boost operation mode on the basis of assessment of an actual value of at least one parameter that is indicative of whether or not the at least one cleaning element is in a wet cleaning condition.
Owner:VERSUNI HLDG BV

Silver-based multi-element near-eutectic medium-temperature vacuum brazing filler metal and preparation method thereof

The invention relates to silver-based multi-element near-eutectic medium-temperature vacuum brazing filler metal and a preparation method thereof, and belongs to the field of non-ferrous metal brazing. The brazing filler metal is prepared from the following components in percentage by weight: 19.5 to 21.0 weight percent of Cu, 9.0 to 10.0 weight percent of In, 4.5 to 5.5 weight percent of Ge, 4.2 to 4.8 weight percent of Sn, 1.8 to 2.2 weight percent of Ni, 1.7 to 2.0 weight percent of Si, 0.05 to 0.2 weight percent of Co and the balance of Ag. The preparation method comprises the steps of intermediate alloy preparation, vacuum medium-frequency induction melting, centrifugal rapid cooling casting, vacuum heat treatment regulation and control, hot rolling cogging, surface treatment and precise cold rolling. The alloy is low in melting point, low in required vacuum brazing temperature, excellent in wetting characteristic for stainless steel, high in joint strength after brazing and capable of meeting the requirements for medium-temperature vacuum brazing packaging, gradient brazing and repair welding of 316L stainless steel base materials in vacuum electronic devices.
Owner:BEIJING INST OF NONFERROUS METALS & RARE EARTH

Low-corrosivity halogen-free soldering flux for aluminum-based part brazing and preparation method of low-corrosivity halogen-free soldering flux

The invention discloses a low-corrosion halogen-free soldering flux for aluminum-based part brazing and a preparation method of the low-corrosion halogen-free soldering flux, and belongs to the technical field of halogen-free welding materials.The low-corrosion halogen-free soldering flux comprises, by mass, 4-6 parts of oxalic acid, 1-2 parts of triethanolamine, 0.8-1.5 parts of Tween-80, 4-6 parts of polyvinylpyrrolidone, 0.3-1 part of compound nano cerium oxide, 0.5-1.5 parts of chitosan oligomer and the balance deionized water. And the welding spot oxidation resistance and the interface self-repairing capability are further improved. Through the synergistic effect of four mechanisms of complexing, oxidation prevention, wetting and film forming, the flux achieves efficient film removal, excellent wetting, no corrosion residue and stable film forming protection, is high in shear strength, low in welding spot porosity and clean in surface after welding, and is suitable for electronic packaging, heat exchanger manufacturing and high-reliability aluminum welding occasions.
Owner:SUZHOU KUNTENGWEI NEW MATERIAL TECH CO LTD

Sn-Bi-In-Ag-Zn high-reliability high-entropy alloy low-temperature solder for advanced packaging and preparation method of Sn-Bi-In-Ag-Zn high-reliability high-entropy alloy low-temperature solder

The invention relates to Sn-Bi-In-Ag-Zn high-reliability high-entropy alloy low-temperature solder for advanced packaging and a preparation method of the Sn-Bi-In-Ag-Zn high-reliability high-entropy alloy low-temperature solder, and belongs to the technical field of electronic packaging materials. The solder comprises, by atomic percent, 25%-35% of tin, 25%-35% of bismuth, 25%-35% of indium, 5% of silver and 5%-10% of zinc, and preparation of the solder is achieved in an induction melting mode. Main phases of the Sn-In-Bi-Ag-Zn high-reliability high-entropy alloy low-temperature solder for electronic packaging are the tin-based solid solution and the indium bismuth phase, bismuth and indium atoms are subjected to high solid solution in the tin-based solid solution, and solid solution strengthening of the solder is promoted. The melting point is only 80-90 DEG C, and the warping problem caused by CET mismatching can be effectively reduced due to the extremely low melting point. The low-temperature wettability is good, and the wetting angle is smaller than or equal to 33 degrees when the copper substrate is wetted at 120 DEG C. Meanwhile, inhibition of interface IMC rapid growth can be achieved without a diffusion barrier layer, a thin IMC layer can still be kept under the conditions of long-time and multiple times of backflow, the volume ratio of the IMC in a micro welding spot can be remarkably reduced, the influence of the IMC on the mechanical property and reliability of the welding spot can be reduced, good mechanical property can still be kept after long-time and multiple times of backflow, and the service life of the welding spot can be prolonged. The method is suitable for advanced packaging such as flexible packaging and 3D IC packaging which require low packaging temperature or high thermal reliability.
Owner:CHONGQING UNIV OF TECH +1

Preparation method of high-activity nitrogen-doped carbon-loaded CoRu nano-alloy

A preparation method of a high-activity nitrogen-doped carbon-loaded CoRu nano-alloy is used for enhancing pH universal hydrogen evolution, and is characterized by comprising the following steps: dissolving dopamine hydrochloride in an aqueous solution containing H2O2 and CuSO4. 5H2O, and magnetically stirring to form a uniform mixture; and pre-wetting carbon cloth with ethanol, immersing the pre-wetted carbon cloth in the dopamine solution for 10 minutes, taking out the pre-wetted carbon cloth, washing the pre-wetted carbon cloth with deionized water for three times, and carrying out vacuum drying to obtain the polydopamine modified carbon cloth marked as PDA / CC. And immersing the obtained PDA / CC into 20 mL of aqueous solution containing Co (NO3) 2.6 H2O and RuCl3 for 6 hours to realize metal ion adsorption. And washing and drying a sample, and calcining the sample in a tubular furnace at 700 DEG C in an N atmosphere for 2 hours to obtain the self-supporting nitrogen-doped porous carbon-loaded CoRu alloy material which is recorded as CoxRu (at) CN / CC. Through a synthesis strategy based on active ion capture and in-situ carbon thermal reduction, and through construction of a nitrogen-doped carbon cobalt ruthenium alloy nanostructure and a strong metal-carrier synergistic effect, efficient hydrogen overflow and establishment of stable active sites are realized; therefore, the performance bottleneck that high activity and high stability of a traditional electrocatalyst in a wide pH range are difficult to cooperate is broken through.
Owner:QINGDAO UNIV OF SCI & TECH

Ionic power generation fabric capable of collecting multi-mode wetting energy

The invention relates to the field of fabrics, and discloses an ionic power generation fabric capable of collecting multi-mode wetting energy. Comprising the following raw materials in parts by weight: a temperature-responsive zwitterionic monomer with the mass percent concentration of 10-50%, a cross-linking agent which accounts for 0.5-3% of the mole number of the temperature-responsive zwitterionic monomer, an initiator which accounts for 1-6% of the mole number of the temperature-responsive zwitterionic monomer, and an initiator which accounts for 1-6% of the mole number of the temperature-responsive zwitterionic monomer, the fabric disclosed by the invention can be simply prepared through a traditional spinning and twisting process, has the characteristics of low cost and high environmental adaptability, and is suitable for large-scale production.
Owner:SHENZHEN UNIV +1

Chemical pre-lithiation reagent for sulfide solid-state battery as well as preparation method and application of chemical pre-lithiation reagent

The invention provides a chemical pre-lithiation reagent for a sulfide solid-state battery as well as a preparation method and application of the chemical pre-lithiation reagent. The chemical pre-lithiation reagent comprises an aromatic compound, a lithium source, a solvent A and a solvent B, wherein the concentration of the aromatic compound in the chemical pre-lithiation reagent is 0.0009 mol / L-8. 5mol / L, the mass ratio of the lithium source to the aromatic compound is (1-10): (10-1), and the mass ratio of the solvent B to the solvent A is (1-10): (5-1); the polarity of the solvent A is 3-7; the polarity of the solvent B is less than 3. According to the pre-lithiation method, the purpose of regulating and controlling the pre-lithiation amount is achieved by preparing the specific pre-lithiation reagent and then soaking or wetting the silicon-based negative electrode piece, the purpose of pre-lithiation of the silicon-based negative electrode is accurately achieved, and the first coulombic efficiency and the energy density of the sulfide all-solid-state battery are improved. Meanwhile, the volume expansion of the silicon-based material is relieved to a certain extent, and the cycle life of the all-solid-state battery is prolonged.
Owner:ENPOWER (PEKING) INC

Current collector disc and battery

Current collector disk comprising a disk body (1) in which a wetting hole (2) is provided which penetrates the disk body (1) along a thickness direction of the disk body (1), wherein the disk body (1) has a first side surface (11) and a second side surface (12) which are arranged opposite each other, wherein a groove (3) is recessed on the first side surface (11) which is in communication with the wetting hole (2) at least at one end.
Owner:EVE POWER CO LTD

Wafer polishing system

ActiveCN222589258UIncreased spray coveragereduce water consumptionWaferPolishing
The utility model discloses a wafer polishing system which at least comprises a polishing table with a polishing pad, a polishing head used for driving a wafer to move relative to the polishing table, and a polishing liquid arm used for conveying polishing liquid to the polishing table, an atomizing spray head is arranged in the space where the polishing table is located, and the atomizing spray head sprays liquid to the area where the polishing pad is located. To form a wetted region on the polishing pad. Atomization wetting of the polishing pad is achieved through the atomization nozzle, the spraying coverage range of the atomization nozzle is large, meanwhile, water consumption is small, and the atomization function can be achieved with the minimum cost; the atomization is realized on the premise of not adding a new water source and a new control structure, and the influence on the work of the wafer polishing system is avoided; and the atomizing nozzle can be flexibly switched between a working state and a closed state, can also be disassembled and assembled at any time, can be flexibly applied to different polishing processes, and is high in use flexibility.
Owner:HANGZHOU ZHONGGUI ELECTRONICS TECH CO LTD