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A kind of tvs device and manufacturing method thereof

A manufacturing method and device technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electric solid-state devices, etc., can solve problems such as increased leakage and increased static power consumption of devices, and achieve reduced parasitic capacitance, reduced cross-expansion size, and cost cheap effect

Active Publication Date: 2021-04-13
CSMC TECH FAB2 CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the transmission rate of high-speed interfaces represented by HDMI (High-Definition Multimedia Interface, high-definition multimedia interface) is getting faster and faster, even up to 5Gbps. In addition, in the actual driver chip, there are as many as several hundred pins, and each pin has ESD risk. In order to protect as many I / O ports as possible while not occupying too much area , which has higher requirements for the integration of TVS; in order to increase the current capability of ESD, the junction area of ​​TVS devices is usually increased, which will lead to a significant increase in leakage, so that the static power consumption of the device is also reduced. obviously increase

Method used

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  • A kind of tvs device and manufacturing method thereof
  • A kind of tvs device and manufacturing method thereof
  • A kind of tvs device and manufacturing method thereof

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Embodiment Construction

[0044] In the following description, numerous specific details are given in order to provide a more thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without one or more of these details. In other examples, some technical features known in the art are not described in order to avoid confusion with the present invention.

[0045] It should be understood that the invention can be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity. Like reference numerals refer to like elements throughout.

[0046]It will be understood that when an element or layer is referred to...

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Abstract

The invention provides a TVS device and a manufacturing method thereof. The TVS device comprises: a semiconductor substrate of a first doping type; a deep well of a first and a second doping type arranged on the semiconductor substrate; type deep well and the first doping type deep well; the first second doping type heavily doped region arranged in the first second doping type deep well; the second second doping type deep well arranged in the second The well region of the first doping type and the first heavily doped region of the first doping type; the heavily doped region of the second first doping type and the second heavily doped region of the second doping type arranged in the well region of the first doping type a heavily doped region; a third heavily doped region of the second doping type located in the well region of the first doping type and a deep well of the second doping type; and a well region disposed in the well region of the first doping type The first doping type doping region. The TVS device provided by the invention has simple structure, low cost, good isolation effect, stronger current discharge capability and smaller capacitance.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a TVS device and a manufacturing method thereof. Background technique [0002] In the whole machine and system, unexpected voltage transients and surges are often encountered, causing the semiconductor devices in the whole machine and system to be burned or broken down, resulting in damage to the whole machine and system. Therefore, TVS (Transient Voltage Suppressor, Transient Voltage Suppressor), as a silicon PN junction high-efficiency protection device, is widely used in various I / O interfaces due to its fast response time and strong ESD resistance. [0003] At present, the transmission rate of high-speed interfaces represented by HDMI (High-Definition Multimedia Interface, high-definition multimedia interface) is getting faster and faster, even up to 5Gbps. In addition, in the actual driver chip, there are as many as several hundred pins, and each pin has ESD risk. In...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/06H01L27/02H01L21/8234H01L21/8232
CPCH01L29/0611H01L29/0603H01L29/0684H01L27/0248H01L21/823487H01L21/8232H01L21/8234H01L27/02H01L27/0262H01L29/87H01L29/20H01L29/16H01L29/74H01L21/2252H01L21/266H01L29/7412H01L29/866
Inventor 程诗康顾炎张森
Owner CSMC TECH FAB2 CO LTD
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