A kind of titanium diboride/boron carbide composite electrode and its preparation method and application
A titanium diboride and composite electrode technology, applied in the field of electrochemical catalysis, can solve the problems of low catalytic activity, high cost, and by-product generation
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[0039] Please refer to Figure 6 , a method for preparing a titanium diboride / boron carbide composite electrode provided in an embodiment of the present invention, comprising:
[0040] Take substrate 1, carry out cleaning operation to described substrate 1, deposit composite coating 2 on described substrate 1 after cleaning, described composite coating 2 comprises titanium diboride and boron carbide 23, obtains titanium diboride / Boron carbide composite electrode.
[0041] The preparation method provided in the embodiment of the present invention can prepare a titanium diboride / boron carbide composite electrode with excellent electrocatalytic nitrogen reduction to ammonia gas performance through a simple process, which is simple to prepare and low in cost, and can be used in harsh conditions Higher lifespan and strong practicability.
[0042] In a preferred embodiment of the present invention, a composite coating 2 is deposited on the substrate 1 after cleaning, and during t...
Embodiment 1
[0050] Step 1: Wash the titanium mesh in acetone, absolute alcohol, and deionized water for 10 minutes, and then dry it in an oven overnight.
[0051] Step 2: Fix the titanium mesh on the baffle and hang it in the magnetron sputtering equipment, keep the substrate parallel and facing the target, the distance between the target and the substrate surface is 8cm, and set the rotation speed of the titanium mesh at the same time It is 2r / min. Then carry out the vacuuming operation. In the vacuuming process, first open the mechanical pump and the rough pumping valve, and when the pressure of the deposition chamber of the magnetron sputtering equipment is pumped to 10Pa, open the maintenance valve to pump the pressure of the deposition chamber to 4Pa. , then close the rough valve, open the high valve, and finally pump the deposition chamber to 5×10 -3 Pa.
[0052] Step 3: The cleaning operation of the target material and the sample is then carried out. During the cleaning process o...
Embodiment 2
[0056] Step 1: Wash the titanium sheet in acetone, absolute alcohol, and deionized water for 20 minutes, and then dry it in an oven overnight.
[0057] Step 2: Fix the titanium sheet on the baffle and hang it in the magnetron sputtering equipment, keep the substrate parallel and facing the target, the distance between the target and the substrate surface is 20cm, and set the rotation speed of the titanium sheet at the same time It is 2r / min. Then carry out the vacuuming operation. In the vacuuming process, first open the mechanical pump and the rough pumping valve, and when the pressure of the deposition chamber of the magnetron sputtering equipment is pumped to 10Pa, open the maintenance valve to pump the pressure of the deposition chamber to 4Pa. , then close the rough valve, open the high valve, and finally pump the deposition chamber to 6×10 -3 Pa.
[0058] Step 3: The cleaning operation of the target material and the sample is then carried out. During the cleaning proce...
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