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Laser structure and preparation method and application thereof

A laser and grating structure technology, applied in the direction of lasers, semiconductor lasers, and optical resonant cavity structures, can solve problems such as poor laser power and single-mode characteristics, poor wavelength adjustment stability, and bulky light source systems, etc., to achieve maximum flexibility, The effect of high assurance and simplified epitaxy process

Active Publication Date: 2020-06-26
VERTILITE CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, since the above technologies require complex optical system construction, the stability of wavelength adjustment is poor.
The light source system is bulky and expensive
The laser power and single-mode characteristics are poor, the performance is unstable, and the manufacturing process is difficult

Method used

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  • Laser structure and preparation method and application thereof
  • Laser structure and preparation method and application thereof
  • Laser structure and preparation method and application thereof

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Embodiment Construction

[0046] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0047] It should be noted that the diagrams provided in this embodiment are only schematically illustrating the basic idea of ​​the present invention, and only the components related to the present invention are shown in the diagrams rather than the number, shape and shape of the components in actual implementation. Dimensional drawing, the type, quantity and proportion of each component can be changed arbitrarily during actual impleme...

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Abstract

The invention provides a laser structure and a preparation method and application thereof. The laser structure comprises a substrate, an epitaxial layer which is arranged on the substrate and comprises a lower cladding, an active layer, an upper cladding and an ohmic contact layer which are stacked, a ridge waveguide which is formed on the upper cladding, a first Bragg grating which is formed on the upper cladding and is positioned on one side of the ridge waveguide, and a second Bragg grating which is formed on the upper cladding and is positioned on the other side of the ridge waveguide, wherein the grating structure of the first Bragg grating is different from the grating structure of the second Bragg grating. The laser structure provided by the invention is stable in structure, small in optical loss, simple in process and easy to implement, and the signal intensity, stability and spectral quality of a terahertz wave light source can be effectively improved.

Description

technical field [0001] The invention relates to the technical field of semiconductor lasers, in particular to a laser structure and its preparation method and application. Background technique [0002] Lasers show great application prospects in the field of terahertz wave (THz) radiation due to their narrow spectral width and stable optical performance. At present, the use of difference frequency technology to generate THz waves has been widely used, such as external cavity optical modulation, double distributed feedback semiconductor laser (DFB-LD) light source technology, etc., all use difference frequency technology to obtain THz waves. [0003] However, since the above technologies require complex optical system construction, the stability of wavelength adjustment is poor. The light source system is bulky and expensive. The laser power and single-mode characteristics are poor, the performance is unstable, and the manufacturing process is difficult. Therefore, it is ve...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/10H01S5/12H01S5/22
CPCH01S5/1096H01S5/1228H01S5/1237H01S5/22
Inventor 李齐柱毛明明周特张鹏飞徐真真
Owner VERTILITE CO LTD
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