Electrostatic discharge protection structure and electrostatic discharge protection circuit
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- SEMICON MFG INT (SHANGHAI) CORP
- Publication Date
- 2020-07-14
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Abstract
Description
technical field
[0001] The embodiments of the present invention relate to the field of electrostatic discharge protection, in particular to an electrostatic discharge protection structure and an electrostatic discharge protection circuit. Background technique
[0002] Electrostatic discharge is a common phenomenon in the process of manufacturing, producing, assembling, testing, storing, and transporting semiconductor devices or circuits. The / output pin is passed into the integrated circuit and destroys the internal circuit of the integrated circuit.
[0003] In order to solve this problem, it is usually necessary to set up a protection circuit between the internal circuit and the input / output pin. This protection circuit must be activated before the pulse current of electrostatic discharge reaches the internal circuit to quickly eliminate the excessive voltage. Further, damage caused by ESD (Electrostatic Discharge, electrostatic discharge) phenomenon is reduced.
[0004] ...