Visible-infrared independent control electrochromic device
A technology of electrochromic devices and electrochromic layers, applied in instruments, nonlinear optics, optics, etc., can solve the problems of weak adjustment ability of mid- and far-infrared, achieve the effects of reducing production costs, wide adjustment range, and improving adjustment ability
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Embodiment 1
[0049] Firstly, the ITO transparent conductive glass substrate is used to ultrasonically clean the substrate with acetone, ethanol, and deionized water for 20 minutes, then fix it on the substrate tray with high-temperature tape, put it into the sample chamber, and turn on the mechanical pump to pump it below 5Pa. Flapper valve, feeding vacuum (background vacuum) to reach 10 -4 In the sputtering chamber below Pa. The first electrochromic layer and the second electrochromic layer are prepared by continuous deposition on the surface of the magnetron sputtering method. With metal tungsten as the target, the sputtering gas is argon and oxygen, the total pressure is 2.0Pa, the oxygen partial pressure is 6%, the distance between the target and the substrate is 15cm, and the initial substrate temperature is room temperature. The power of the DC power supply is 70W or the power density is 1.54W / cm 2 , the deposition time is 30 min, and an inorganic electrochromic layer film (ie, the...
Embodiment 2
[0051] Firstly, the ITO transparent conductive glass substrate is used to ultrasonically clean the substrate with acetone, ethanol, and deionized water for 20 minutes, then fix it on the substrate tray with high-temperature tape, put it into the sample chamber, and turn on the mechanical pump to pump it below 5Pa. Flapper valve, feeding vacuum (background vacuum) to reach 10 -4 In the sputtering chamber below Pa. The first electrochromic layer and the second electrochromic layer are prepared by continuous deposition on the surface of the magnetron sputtering method. With metal tungsten as the target, the sputtering gas is argon and oxygen, the total pressure is 2.0Pa, the oxygen partial pressure is 6%, the distance between the target and the substrate is 15cm, and the initial substrate temperature is room temperature. The power of the DC power supply is 70W or the power density is 1.54W / cm 2 , the deposition time is 15 minutes, and an inorganic electrochromic layer film (ie,...
Embodiment 3
[0053] Firstly, the ITO transparent conductive glass substrate is used to ultrasonically clean the substrate with acetone, ethanol, and deionized water for 20 minutes, then fix it on the substrate tray with high-temperature tape, put it into the sample chamber, and turn on the mechanical pump to pump it below 5Pa. Flapper valve, feeding vacuum (background vacuum) to reach 10 -4 In the sputtering chamber below Pa. The first electrochromic layer and the second electrochromic layer are prepared by continuous deposition on the surface of the magnetron sputtering method. With metal tungsten as the target, the sputtering gas is argon and oxygen, the total pressure is 2.0Pa, the oxygen partial pressure is 6%, the distance between the target and the substrate is 15cm, and the initial substrate temperature is room temperature. The power of the DC power supply is 70W or the power density is 1.54W / cm 2 , the deposition time is 30 min, and an inorganic electrochromic layer film (ie, the...
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