High-energy hydrogen ion implantation device and method

Abstract

The invention discloses a high-energy hydrogen ion implantation method and device. The device is characterized in that a negative hydrogen ion source is located at the left side of a main accelerator,and is in sealed connection with an inlet of the main accelerator through a rubber ring; a first magnetic lens is arranged between the outlet of the negative hydrogen ion source and the inlet of themain accelerator; a cryogenic pump and a molecular pump are respectively positioned on an upper cover plate and a lower cover plate of the main accelerator; electrodes of the main accelerator comprisean intermediate electrode and a high-voltage electrode, and the intermediate electrode and the high-voltage electrode are electrified by a high-voltage power supply to form an electric field to accelerate ions; a stripping film is located on the high-voltage electrode, negative hydrogen ions are converted into protons, and a second magnetic lens is arranged between an outlet of the main accelerator and a scanning deflection device. The device is compact in structure, the same group of electrodes are used for carrying out two-stage acceleration on ions, the number of the electrodes is reduced,the size of the whole accelerator is smaller, and the manufacturing cost is lower. In addition, energy control and linkage can be accurately realized, and stable and high-energy ions can be obtained.

Description

technical field [0001] The invention belongs to the fields of proton therapy and semiconductor manufacturing, and in particular relates to a tandem accelerator. In addition, the invention also relates to a high-energy ion implanter with the accelerator, which is mainly used in the fields of IGBT and other power electronics and integrated circuit semiconductor manufacturing. Background technique [0002] In today's society, semiconductor components have penetrated into every aspect of modern life. It is the core component of most electronic products such as computers and mobile phones, such as processors and memories, which contain a large number of semiconductor components. Therefore, semiconductor components have played a vital role in modern information equipment. An important process in the semiconductor manufacturing process is ion implantation. Ion implantation refers to focusing, accelerating and deflecting ions from an ion source to irradiate the target material, t...

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Problems solved by technology

[0003] It is difficult for existing ion implanters to meet higher energy requirements, and the beam quality is poor, resulting in a low yield rate of semiconductor components, which has been difficult to meet the increasing requirements of semiconductor high-precision manufacturing process

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