Functional film structure and preparation method thereof, refrigeration film and refrigeration product
A technology of functional film and film layer structure, applied in refrigeration and liquefaction, refrigerators, chemical instruments and methods, etc., can solve the problems of affecting the service life of the reflective film structure, peeling off of the silver reflective film and the flexible base film, and the separation of the silver reflective film and the flexible base film. Large base film and other problems, to achieve the effect of improving oxidation resistance and salt spray resistance, ensuring interfacial bonding force, and improving overall adhesion
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[0035] The preparation method of the above-mentioned functional film structure comprises,
[0036] S1: Provide basement film;
[0037] S2: setting a reflective layer on the surface of the base film;
[0038] S3: forming a stress buffer layer on the surface of the reflective layer away from the base film, wherein the stress buffer layer has pores, the pores have a diameter of 80nm-100nm, and the pores are in the stress buffer layer The volume percentage is 30%-40%. Among them, the deposition angle range is 60°-70°, and the target-base distance is 11cm-13cm.
[0039] The preparation method of the stress buffer layer 25 is not limited, such as: magnetron sputtering method, electron evaporation method, etc., as long as pores can be formed. The inventors have found through experiments that the bonding effect between the stress buffer layer 25 and the reflective layer 23 formed by the magnetron sputtering method is the best. The principle of the buffering effect of the stress bu...
Embodiment 1
[0063] Such as figure 2 , the functional film structure of this embodiment includes a base film and a reflective layer and a stress buffer layer sequentially stacked on the base film.
[0064] In the functional film structure of this embodiment, the thickness of the base film is 50 μm, and the material of the base film is polyethylene terephthalate; the thickness of the reflection layer is 90 nm, and the material of the reflection layer is silver; the thickness of the stress buffer layer The thickness is 800nm, and the material of the stress buffer layer is Ti. The pore diameter of the prepared stress buffer layer is 90 nm, and the volume percentage of the pores in the stress buffer layer is 34%.
[0065] The functional film structure is installed on the polymer film in an adhesive manner, and the stress buffer layer is pasted on the adhesive layer to obtain a cooling film.
Embodiment 2
[0067] Such as image 3 , The functional film structure of this embodiment includes a base film and a first barrier layer, a reflective layer and a stress buffer layer sequentially stacked on the base film.
[0068] In the functional film structure of this embodiment, the thickness of the base film is 50 μm, and the material of the base film is polyethylene terephthalate; the thickness of the first barrier layer is 20 nm, and the material of the first barrier layer is TiN x The thickness of the reflective layer is 90nm, and the material of the reflective layer is silver; the thickness of the stress buffer layer is 800nm, and the material of the stress buffer layer is Ti. The pore diameter of the prepared stress buffer layer is 90 nm, and the volume percentage of the pores in the stress buffer layer is 34%.
[0069] The functional film structure is installed on the polymer film in an adhesive manner, and the stress buffer layer is pasted on the adhesive layer to obtain a cooli...
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Abstract
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