Polycrystalline silicon wafer surface texturing device based on ferromagnetic abrasion technology
A polysilicon wafer and abrasion technology, which is applied in crystal growth, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of reducing the utilization rate of silicon and not being easy to reuse
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[0043] see Figure 1-2 , a surface texturing device for polycrystalline silicon wafers based on ferromagnetic wear technology, comprising a texturing storage box, the texturing storage box includes a texturing bottom box 1, the top end of the texturing bottom box 1 is clamped with a texturing top cover 2, the texturing The inner bottom of the bottom box 1 is excavated with a plurality of evenly distributed silicon chip storage tanks 3. The silicon chip storage tanks 3 are provided with polycrystalline silicon chips 4. The left and right ends of the textured top cover 2 are embedded with transmission conduits 5, two The outer ends of the transmission conduit 5 are connected with hydraulic pumps, through which the passivation solvent 7 is continuously input into the texturing storage box, the transmission conduit 5 and the texturing storage box are connected to each other, and a movable grinding iron block 6 is arranged in the texturing storage box and passivation solvent 7, the...
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