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Dedusting and cleaning silicon wafer texturization agent and preparation method thereof

A texturing agent and cleaning technology, which is applied in the field of dust removal and cleaning silicon wafer texturing agent and its preparation, can solve the problems of adverse effects on finished product quality, large consumption of chemicals, and low reaction controllability, so as to avoid adverse effects , Product quality is stable, and the effect of improving the efficiency of cashmere making

Inactive Publication Date: 2015-12-02
安徽飞阳能源科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The isopropanol and other components used in the existing texturing liquid have large volatilization, poor environmental protection, short service life, large chemical consumption, low reaction controllability, and poor texturing repeatability, which directly affect product quality
If there are particulate matter residues during the cleaning process of raw materials, it will have a negative impact on the quality of finished products, increase abnormalities, and cause unnecessary waste

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0013] Non-limiting examples of the present invention are as follows:

[0014] A kind of dust-removing and cleaning silicon chip texturizing agent is prepared from the component raw materials of following weight (kg):

[0015] Dodecyl Ethoxy Sultaine 1, Sodium Hydroxide 2.5, Allantoin 0.5, Propylene Glycol Methyl Ether 1, Texturing Regulator 10, Tetrasodium EDTA 1, Sodium Hydroxymethylglycinate 0.4, Soybean oil 0.4, water 150;

[0016] Wherein the texturizing regulator is made of the following component raw materials by weight (kg): styrene 3, methyl methacrylate 2, polyvinyl alcohol 2, cornstarch 1, potassium persulfate 0.1, flat plus 0.5, water 80; The preparation method of the texture regulator is to add polyvinyl alcohol and corn starch to 1 / 2 amount of water and stir at 60°C for 1 hour, then add Pingpingjia and stir for 5 minutes at 1000r / min, add styrene, methyl methacrylate and potassium persulfate Mix well and heat to 85°C to react for 0.5h, and finally add the remai...

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PUM

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Abstract

The invention discloses a dedusting and cleaning silicon wafer texturization agent. The silicon wafer texturization agent comprises, by weight, 0.5-1 part of dodecyl oxethyl sulphobetaine, 1.5-2.5 parts of sodium hydroxide, 0.3-0.5 part of allantoin, 0.5-1 part of propylene glycol monomethyl ether, 5-10 parts of texturization regulator, 0.5-1 part of tetrasodium EDTA, 0.2-0.4 part of sodium hydroxymethylglycinate, 0.2-0.4 part of soybean oil and 100-150 parts of water. The silicon wafer texturization agent can improve texturization efficiency and effectively improve battery piece conversion efficiency and has great cleaning, decontaminating and dedusting capacity, particle residual on the surface of a silicon wafer is avoided, harmful influences caused when raw materials are not cleaned thoroughly can be avoided, raw material requirements are lowered, production cost is lowered, product quality is stable, and economy is good.

Description

technical field [0001] The invention relates to silicon chip texturing technology, in particular to a silicon chip texturing agent for removing dust and cleaning the silicon chip and a preparation method thereof. Background technique [0002] Texturing is an important process in the production process of solar cells. Using the principle of anisotropic corrosion of single crystal silicon by low-concentration alkaline etching solution, a "pyramid" structure is formed on the surface of the silicon wafer to reduce the reflectivity of the silicon wafer surface and increase Absorb light, reduce reflectivity, and improve conversion efficiency of solar cells. At present, the conventional texturing process generally uses sodium hydroxide or potassium hydroxide, and adds a suitable mixed solution of isopropanol and sodium silicate for texturing. The isopropanol and other components used in the existing texturing liquid have large volatilization, poor environmental protection, short s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/10C30B29/06
Inventor 王泽庆
Owner 安徽飞阳能源科技有限公司
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