Photonic crystal based on laser etching graphene film stack and processing method

Abstract

The invention provides a photonic crystal based on laser etching graphene film stacking, which comprises a plurality of double-layer crystal structures stacked together, each double-layer crystal structure comprises a glass substrate and a graphene film, and a periodic microstructure pattern is arranged in an area, corresponding to the hollow part of the annular glass substrate, on the graphene film. A graphene film layer and an air layer are formed on the double-layer crystal structure, and the thickness of the air layer can be adjusted by changing the thickness of the glass substrate; the periodic microstructure pattern on the graphene film is manufactured by adopting a laser etching method according to a design pattern. The invention further provides a processing method of the photoniccrystal based on laser etching of the graphene film stack. According to the method, the photonic crystal can be rapidly prepared, the process is simple and easy to implement, parameters such as the size of the designed micro-periodic structure and an etching pattern can be rapidly adjusted, finally, control over propagation of light with different frequencies in the photonic crystal is achieved, and the method has excellent design flexibility and parameter adjustability.

Description

technical field [0001] The invention belongs to the technical field of laser processing applications, and in particular relates to a photonic crystal and a processing method based on a laser-etched graphene film stack. Background technique [0002] Laser etching processing is to focus the low-power laser beam with high beam quality into a very small spot, form a high power density at the focal point, generate a high energy density in a very short time, and use its high energy to make the material Rapid vaporization, evaporation and melting, forming structures such as holes and seams. Since the laser beam has the characteristics of being focused into a very small spot at the laser wavelength level, laser etching technology can process lines with a width of micron level. Since laser processing is non-contact processing, and has the characteristics of high flexibility, fast processing speed, no noise, and small heat-affected area, laser etching processing has good dimensional ...

AI Technical Summary

Problems solved by technology

In addition, after most photonic crystals are prepared, their characteristics are difficult to change, and they can only produce energy band effects on light waves of specific frequencies. Some types of photonic crystals can be changed during the work process, but it takes a long time to modify the structure , the regulation efficiency is very low, and the regulation range is very narrow

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