Process for removing arsenic in process of preparing anhydrous hydrogen fluoride by fluosilicic acid method

A technology of anhydrous hydrogen fluoride and fluosilicic acid, applied in the direction of fluorine/hydrogen fluoride, hydrogen fluoride, etc., can solve the problems of high arsenic content in the rectification system, high As content in the product, and limited effect of arsenic removal, achieving high purity, low harm, Ease of mass production

Inactive Publication Date: 2020-11-10
福建瓮福蓝天氟化工有限公司
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Problems solved by technology

[0003] The arsenic content of the raw material fluorosilicate currently supplied is relatively high, and can contain more than 50ppm when it is high. 3 form exists
Arsenic in anhydrous hydrogen fluoride generally exists in the form of trivalent ions, while AsF 3 I

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  • Process for removing arsenic in process of preparing anhydrous hydrogen fluoride by fluosilicic acid method
  • Process for removing arsenic in process of preparing anhydrous hydrogen fluoride by fluosilicic acid method
  • Process for removing arsenic in process of preparing anhydrous hydrogen fluoride by fluosilicic acid method

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Embodiment Construction

[0028] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0029] see Figure 1-4 , the present invention provides a technical solution:

[0030] A process for removing arsenic in the process of preparing anhydrous hydrogen fluoride by fluosilicic acid method, the removal process comprises the following steps:

[0031] Step 1: Fluosilicic acid is pre-purified, and the raw material fluosilicic acid is pre-purified through the filter on the microporous filter I, and a small amount of solid microparticles such as silica...

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Abstract

The invention relates to the technical field of arsenic removal of anhydrous hydrogen fluoride, in particular to a process for removing arsenic in the process of preparing anhydrous hydrogen fluorideby a fluosilicic acid method, which comprises the following steps of: 1, pre-purifying fluosilicic acid; 2, pre-oxidizing trivalent arsenic in fluosilicic acid; 3, carrying out further catalytic oxidation on trivalent arsenic by using microporous filtration II hydrogen peroxide; 4, treating the materials with a concentration and reaction system; 5, screening silicon dioxide; 6, gasifying and decomposing the material; 7, treating the material through a hydrogen fluoride reboiling system and a drying separation system. The method has the beneficial effects that hydrogen peroxide and manganese dioxide can be added as catalysts under the conditions of normal temperature and acidity to oxidize arsenic in fluosilicic acid into pentavalent arsenic; since a small amount of trivalent arsenic cannotreact with hydrogen fluoride to generate arsenic trifluoride difficult to separate under the condition that the boiling point of arsenate is 160 DEG C, the oxidation operation and cost are low, large-batch production is facilitated, and the obtained anhydrous hydrogen fluoride is high in purity and small in harm.

Description

technical field [0001] The invention relates to the technical field of arsenic removal of anhydrous hydrogen fluoride, in particular to a process for removing arsenic in the process of preparing anhydrous hydrogen fluoride by a fluorosilicic acid method. Background technique [0002] At present, the products obtained from the production of anhydrous hydrogen fluoride from fluosilicic acid all have high impurity content. There are some research reports on the removal of impurities, but there are few cases of industrial removal. Wengfu Lantian Company is the exclusive unit to realize the industrial application of fluosilicic acid to anhydrous hydrogen fluoride technology. Impurities will affect product quality and are not conducive to the use of products in various downstream industries of hydrogen fluoride. Removing impurities from anhydrous hydrogen fluoride is a common problem in the industry. The use of hydrogen fluoride to produce other fluorine salts and fluorine-contain...

Claims

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Application Information

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IPC IPC(8): C01B7/19
CPCC01B7/193C01B7/196
Inventor 燕如勇严江有潘昌强兰桥海黄土金
Owner 福建瓮福蓝天氟化工有限公司
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