Silicon wafer acid cutting method adopting double-state circulation enrichment technology
A cutting method, enrichment technology
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[0043] See figure 1 , A method for acidic cutting of silicon wafers with two-state cycle enrichment technology, including the following steps:
[0044] S1. Use semiconductor refrigeration chips to heat the volatile acid solution to 50°C to generate hydrogen chloride gas and water vapor. At the same time, use semiconductor refrigeration chips to cool the modified cutting steel wire;
[0045] S2. Contact the volatile acid gas and water vapor obtained by heating with the modified cutting steel wire to liquefy the volatile acid gas and water vapor on its surface and re-enrich a large amount of volatile acid solution;
[0046] S3. Use a modified steel wire rope enriched with a large amount of volatile acid solution to cut a large silicon wafer, and use the corrosive effect of volatile acid to separate the large silicon wafer into several small silicon wafers.
[0047] The volatile acid solution in S1 is any one or more of hydrochloric acid, hydrofluoric acid and nitric acid. By setting the ...
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