Preparation method and application of infrared luminescent material hidden mark
An infrared luminescent and marking technology, which is applied in the direction of luminescent materials, nanotechnology for materials and surface science, chemical instruments and methods, etc., can solve the problem of precise and effective strike against unfavorable suspects and the lack of means of displaying marks , Detrimental to the physical and mental health of staff and other issues
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[0030] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0031] The present invention adopts the following scheme: a method for preparing a concealed mark of an infrared luminescent material, comprising the following steps:
[0032] Step 1. Select the matrix material: the matrix material includes 4 types of halide system, oxide system, oxyfluoride system and sulfide system, respectively select Y 2 o 3 , ZrO 2 、NaYF 4 、YVO 4 , Y 2 o 2 S and GdOCI, whose phonon energy is 550 cm -1 、500cm -1 、350cm -1 、890cm -1 、520cm -1 and 500cm -1 , choose a minimum of 350cm according to the phonon energy -1 NaYF 4 As a matrix material, Er, Tb, Dy, Sm ions are used as activator...
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