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Pixelated scintillator film and preparation method thereof

A scintillator, pixelated technology, applied in chemical instruments and methods, luminescent materials, etc., can solve the problems of limiting the practical application of traditional scintillators, reducing imaging resolution, and the high toxicity of thallium element, achieving the solution of harsh preparation conditions, The effect of improving spatial resolution and high light yield

Pending Publication Date: 2021-03-23
EZHOU INST OF IND TECH HUAZHONG UNIV OF SCI & TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The applicant discovered during the invention process that although the method of using a porous silicon template can reduce the degree of light scattering and crosstalk between GOS scintillator pixels, the light scattering generated by GOS particles in each hole still exists, which reduces the resolution of imaging. Rate
In addition, the preparation conditions of CsI:Tl scintillators are harsh, and the thallium element is highly toxic. These shortcomings limit the practical application of traditional scintillators.

Method used

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  • Pixelated scintillator film and preparation method thereof
  • Pixelated scintillator film and preparation method thereof
  • Pixelated scintillator film and preparation method thereof

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preparation example Construction

[0036] According to another typical embodiment of the present invention, a method of preparing a pixelated scintillator film is provided, and the preparation method comprises:

[0037] S1. Get CS 3 Cu 2 X 5 Crystals; in this embodiment, specifically: S1.1. Quantitative scale CSX and CUX, add to a volume of HX solution, heating CS 3 Cu 2 X 5 Transparent solution; where X is a halogen element; where CS 3 Cu 2 X 5 In the transparent solution, the concentration of CSX and CUX is 0.12mol L. -1 -0.22 mol L -1 At the same time as CSX and CUX are added to the HX solution, the total volume of the solution is reduced by 2% -10% of secondary phosphoric acid;

[0038] S1.2. Will CS 3 Cu 2 X 5 Transparent solution cools down, obtain CS 3 Cu 2 X 5 Crystal; specifically, 3 Cu 2 X 5 The transparent solution cools down at a rate of 1 ° C / min to 5 ° C / min until it is reduced to room temperature, CS 3 Cu 2 X 5 Due to the decrease in solubility, crystals were precipitated, then flush multiple tim...

Embodiment 1

[0049] Add CSCL and Cucl to HCl solution, CSCL and Cucl's puzzle concentration 0.2 mol L -1 Further, 2% hypophosphoric acid with a total volume ratio of the solution is reduced, and the control cooling speed is 1 ° C / min, and the solution is reduced to room temperature, CS 3 Cu 2 CL 5 Due to the decrease in solubility, crystals were precipitated, rinsed multiple times with isopropanol and then dried in vacuo;

[0050] Worts a good CS 3 Cu 2 CL 5 The crystal is ground into powder, placed on the quartz sheet to heat melting, then put a porous alumina template, placing a preheated quartz piece above, to cool down to room temperature, peel the stone, to obtain a pixelated CS 3 Cu 2 CL 5 film.

Embodiment 2

[0052] The CSBR and CUBR were added to the HBR solution, the purified concentration of CSBR and CUBR was 0.2 mol L -1 And the 2% hypophosphoric acid of the total volume ratio of the solution was added dropwise, and the controlled cooling speed was 5 ° C / min, and the solution was lowered to room temperature, CS 3 Cu 2 Br 5 Due to the decrease in solubility, crystals were precipitated, rinsed multiple times with isopropanol and then dried in vacuo;

[0053] Worts a good CS 3 Cu 2 Br 5 The crystal is ground into powder, placed on the quartz sheet to heat melting, then put a porous alumina template, placing a preheated quartz piece above, to cool down to room temperature, peel the stone, to obtain a pixelated CS 3 Cu 2 Br 5 film.

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Abstract

The invention particularly relates to a pixelated scintillator film and a preparation method thereof, and belongs to the technical field of scintillator preparation, the pixelated scintillator film comprises a porous matrix, the porous matrix is a porous alumina template, pores of the porous matrix are filled with a scintillator, and the scintillator comprises Cs3Cu2X5, wherein X is a halogen element, and elements contained in Cs3Cu2X5 are non-toxic. According to the Cs3Cu2X5 crystal, the problems caused by the fact that a traditional CsI scintillator uses toxic elements are solved, the luminescence mechanism of the Cs3Cu2X5 crystal is self-confinement exciton luminescence, and therefore the Cs3Cu2X5 crystal has the advantages of being high in luminescence efficiency, high in light yield and the like when applied to X-ray detection, and the X-ray detection performance is excellent; the anodic aluminum oxide template is used as a substrate, so that the problem of optical crosstalk caused by scintillation light scattering of a scintillator in the prior art is solved, and the problem of harsh scintillator preparation conditions in the prior art is solved; and the spatial resolution ofX-ray imaging is improved, and the actual application of the scintillator can be developed.

Description

Technical field [0001] The present invention belongs to the technical field of steel preparation, and more particularly to a pixelated scintillator film and a preparation method thereof. Background technique [0002] High resolution X-ray imaging technology has important applications in many areas such as medical imaging, safety inspection, and high energy physics. The traditional scintillator is designed to improve the spatial resolution of the imaging, for example, mixed a thiol oxide (GOS) nanoparticle with the binder and filled into a silicon substrate which is etched to the microporous array. Pixelated scintillator film. Another conventional scintillator is a method for preparing a doped hydrazine column crystal scintillator (CSI: TL) by a method of vapor deposition, and finally filled the low refractive index material into the gap of the columnar crystal, and prepared a pixinization Scintillator film. The method can effectively avoid light scattering and optical crosstalk b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K11/61C09K11/02
CPCC09K11/616C09K11/02
Inventor 唐江赵雪
Owner EZHOU INST OF IND TECH HUAZHONG UNIV OF SCI & TECH