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A device for detecting the thickness of anodic gas film in electrolyte plasma polishing and its detection method

A plasma and electrolyte technology, applied in the direction of electric/magnetic thickness measurement, electromagnetic measuring device, etc., can solve the problems of unclear influencing factors, affecting material removal rate and processing effect, etc., and achieve the expansion of measurement range, simple structure and low cost Effect

Active Publication Date: 2021-10-22
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The gas film produced during electrolyte plasma polishing and processing is mainly composed of water vapor and oxygen. Its impedance value is much larger than that of the conductive medium, and its thickness is small, about 0.3~3mm. The thickness of the gas film directly determines the electric field strength and The current density on the surface of the anode affects the material removal rate and processing effect
Although electrolyte plasma polishing and processing technology has been applied to a certain extent, the factors affecting its material removal mechanism and gas film thickness are still unclear, but the monitoring of gas film thickness during electrolyte plasma polishing and processing is very important for exploring its material removal mechanism and improving The processing effect is of great significance

Method used

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  • A device for detecting the thickness of anodic gas film in electrolyte plasma polishing and its detection method
  • A device for detecting the thickness of anodic gas film in electrolyte plasma polishing and its detection method
  • A device for detecting the thickness of anodic gas film in electrolyte plasma polishing and its detection method

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Embodiment 1

[0034] Such as figure 1 As shown, a device for monitoring the gas film thickness of an electrolyte plasma polishing anode is composed of an anode fixture 1 , a gas film thickness measuring patch 2 , and a voltage measuring instrument 3 . The anode fixture and the air film thickness measuring patch are bonded and connected with high-strength insulating glue, and the fine conductive wire 23 (50-100 microns in diameter) is connected with the voltage measuring instrument 3 through the wire 25 . The corresponding device numbers (0, 1, 2, 3...) on the voltage tester (the measurable voltage range is 0-1500V) correspond to each fine conductive wire laid side by side.

[0035] Such as figure 2As shown, the air film thickness measuring patch 2 is composed of a fine conductive wire 23 and two pieces of mica sheets 22 (thickness 0.5-2 mm) used to clamp the fine conductive wire. The fine conductive wires are coated with insulating varnish, and are laid side by side with numbers (0, 1, 2...

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Abstract

The invention relates to a device for detecting the gas film thickness of an electrolyte plasma polishing anode and a detection method thereof. The device comprises an anode fixture, a gas film thickness measuring patch and a voltage measuring instrument; the gas film thickness measuring patch is pasted on the concave surface of the anode fixture On the top, the fine conductive wire is connected to the voltage measuring instrument through a wire; the voltage tester is equipped with a voltage value display and a fine conductive wire selection knob, and the number corresponding to the selection knob corresponds to the fine conductive wire; the gas film thickness measurement patch is laid side by side. The first one of the tiny conductive wires is connected to the anode, and the other end is connected to the positive pole of the voltage measurement circuit; the rest of the fine conductive wires are connected to the metal sheets evenly distributed on the knob round platform through wires, and the voltage between the anode and each metal sheet is measured. Change trend, film thickness is detected according to the diameter and spacing between conductive filaments. The invention is convenient to carry, simple to operate and low in cost, and can monitor the thickness of the anode gas film in electrolyte plasma polishing in real time.

Description

technical field [0001] The invention relates to the technical field of electrolyte plasma polishing and processing, in particular to a device and method for monitoring the thickness of an anode gas film in electrolyte plasma polishing. Background technique [0002] Electrolyte plasma polishing and processing technology is a green and efficient surface polishing, cleaning and deburring technology gradually developed in the past 30 years. It has extremely wide application prospects in aerospace, medical equipment, precision instruments and other fields. It is mainly used to reduce the surface roughness value of the workpiece, improve the smoothness, remove the edge burrs of complex workpieces, and the processed workpieces have certain corrosion resistance. [0003] Electrolyte plasma polishing is a special electrochemical surface treatment method. Specifically, a special case of anodic electrochemical dissolution, which, unlike electrochemical polishing, requires higher volta...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B7/06
CPCG01B7/06
Inventor 苏宏华周传强张钊丁文锋徐九华傅玉灿陈燕
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS