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Device for detecting thickness of electrolyte plasma polishing anode gas film and detection method thereof

A plasma and electrolyte technology, applied in electric/magnetic thickness measurement, electromagnetic measurement devices, etc., can solve the problems of unclear influencing factors, affecting material removal rate and processing effect, etc. Effect

Active Publication Date: 2021-03-30
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The gas film produced during electrolyte plasma polishing and processing is mainly composed of water vapor and oxygen. Its impedance value is much larger than that of the conductive medium, and its thickness is small, about 0.3~3mm. The thickness of the gas film directly determines the electric field strength and The current density on the surface of the anode affects the material removal rate and processing effect
Although electrolyte plasma polishing and processing technology has been applied to a certain extent, the factors affecting its material removal mechanism and gas film thickness are still unclear, but the monitoring of gas film thickness during electrolyte plasma polishing and processing is very important for exploring its material removal mechanism and improving The processing effect is of great significance

Method used

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  • Device for detecting thickness of electrolyte plasma polishing anode gas film and detection method thereof
  • Device for detecting thickness of electrolyte plasma polishing anode gas film and detection method thereof
  • Device for detecting thickness of electrolyte plasma polishing anode gas film and detection method thereof

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Embodiment 1

[0034] Such as figure 1 As shown, a device for monitoring the gas film thickness of an electrolyte plasma polishing anode is composed of an anode fixture 1 , a gas film thickness measuring patch 2 , and a voltage measuring instrument 3 . The anode fixture and the air film thickness measuring patch are bonded and connected with high-strength insulating glue, and the fine conductive wire 23 (50-100 microns in diameter) is connected with the voltage measuring instrument 3 through the wire 25 . The corresponding device numbers (0, 1, 2, 3...) on the voltage tester (the measurable voltage range is 0-1500V) correspond to each fine conductive wire laid side by side.

[0035] Such as figure 2As shown, the air film thickness measuring patch 2 is composed of a fine conductive wire 23 and two pieces of mica sheets 22 (thickness 0.5-2 mm) used to clamp the fine conductive wire. The fine conductive wires are coated with insulating varnish, and are laid side by side with numbers (0, 1, 2...

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Abstract

The invention relates to a device for detecting the thickness of an electrolyte plasma polishing anode gas film and a detection method thereof. The device comprises an anode clamp, a gas film thickness measuring patch and a voltage measuring instrument, wherein the gas film thickness measuring patch is adhered to the concave surface of the anode clamp, and the fine conductive wire is connected with the voltage measuring instrument through a wire; the voltage tester is provided with a voltage value display and a fine conductive wire selection knob, and the number corresponding to the selectionknob corresponds to the fine conductive wire. A first fine conductive wire of a plurality of fine conductive wires laid side by side in the gas film thickness measuring patch is connected with the anode, and the other end is connected with the anode of the voltage measuring circuit; other fine conductive wires are connected with metal sheets uniformly distributed on the knob circular truncated cone through wires, and the film thickness is detected according to the diameter of the conductive wires and the distance between the conductive wires by measuring the voltage change trend between the anode and each metal sheet. The device is convenient to carry, easy to operate, low in cost and capable of monitoring the thickness of the electrolyte plasma polishing anode gas film in real time.

Description

technical field [0001] The invention relates to the technical field of electrolyte plasma polishing and processing, in particular to a device and method for monitoring the thickness of an anode gas film in electrolyte plasma polishing. Background technique [0002] Electrolyte plasma polishing and processing technology is a green and efficient surface polishing, cleaning and deburring technology gradually developed in the past 30 years. It has extremely wide application prospects in aerospace, medical equipment, precision instruments and other fields. It is mainly used to reduce the surface roughness value of the workpiece, improve the smoothness, remove the edge burrs of complex workpieces, and the processed workpieces have certain corrosion resistance. [0003] Electrolyte plasma polishing is a special electrochemical surface treatment method. Specifically, a special case of anodic electrochemical dissolution, which, unlike electrochemical polishing, requires higher volta...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B7/06
CPCG01B7/06
Inventor 苏宏华周传强张钊丁文锋徐九华傅玉灿陈燕
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS