A device for enhancing adsorption rate by radio frequency discharge plasma

A plasma and radio frequency discharge technology, applied in the direction of plasma, electrical components, etc., can solve the problem of slow gas adsorption rate

Active Publication Date: 2022-03-08
DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The present invention is made in view of the above facts, and mainly aims at the problems such as the slow adsorption rate of some gases after the activation of traditional getters, and its purpose is to provide a device for increasing the gas adsorption rate through discharge plasma

Method used

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  • A device for enhancing adsorption rate by radio frequency discharge plasma
  • A device for enhancing adsorption rate by radio frequency discharge plasma

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Experimental program
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Embodiment 1

[0032] The radio frequency power source used in this embodiment is 13.56MHz, and the output power is adjustable within 500W. The high-voltage output end of the RF power supply is connected to one end of the copper solenoid with a diameter of 6mm through a high-frequency coaxial line with a metal mesh on the outside, and the low-voltage output end is connected to the ground wire and connected to the copper solenoid through a wire on the other end. The copper solenoid consists of 10 turns, with an inner diameter of 40mm, nested and coiled outside the hollow container of the vacuum chamber. The hollow container is made of high-temperature-resistant quartz material. It is a hollow cylindrical structure with a thick upper end and a thinner end. The outer diameter of the upper end is 40mm, the thickness of the tube wall is 2mm, and the height is 145mm. The outer diameter of the lower end is 20mm, the wall thickness is 2mm, and the height is 50mm. The upper opening of the hollow con...

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Abstract

The invention relates to a device for enhancing adsorption rate by radio frequency discharge plasma, which comprises a vacuum chamber, a vacuum system component, a gas supply system component, an electric heating system, a radio frequency power supply system and an air pressure collection system component. When the vacuum chamber obtains vacuum through the vacuum system components such as ball valve and mechanical pump, and the gas type and pressure are adjusted by the gas supply system components such as the gas supply source and the mass flow meter, the getter placed in the vacuum chamber is heated by electric heating. The electric heating system composed of wire, power supply and ground wire activates the suction, and at this time, the radio frequency power supply system composed of radio frequency power supply, high frequency coaxial line and radio frequency coupling coil is turned on to generate plasma. The real-time change of the air pressure in the chamber is monitored through the acquisition system components such as vacuum gauge, vacuum gauge display, digital information acquisition card and computer, and the plasma generated by it effectively improves the gas absorption rate.

Description

technical field [0001] The invention belongs to the field of electromagnetic and material applications, and in particular relates to a device for enhancing adsorption rate by radio frequency discharge plasma. Background technique [0002] At present, industrial applications and basic scientific research in many fields need to be carried out in a vacuum environment, including coating, heat treatment, micro-electromechanical systems, surface science, atomic physics, nanotechnology and semiconductor industry. For vacuum technology, the internal vacuum environment and vacuum degree directly affect the working range and efficiency, especially after entering the 21st century, with the continuous improvement of various application indicators and the deepening of basic discipline research, its operation and research All environments require different degrees of high vacuum or even ultra-high vacuum to maintain, which also puts forward higher requirements and challenges for the proce...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05H1/46
CPCH05H1/46
Inventor 杨亮石文波李庆伟耿自才周灿华李永钊回晓康金玉奇
Owner DALIAN INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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