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Scattered metal continuous crystallization purification device and crystallization purification method

A scattered metal and crystallization technology, applied in the field of crystallization and purification equipment, can solve the problems of high-purity crystal pollution, low efficiency, and incomplete separation, and achieve the effect of high-purity cooling crystallization purification, high purification efficiency, and simple structure

Active Publication Date: 2021-04-09
CENT SOUTH UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The main problems existing in the existing high-purification preparation process and equipment for scattered metals are: the solid-liquid separation of the crystallization crystal and the crystallization mother liquor is difficult, the separation is not complete, the crystallization mother liquor is enriched with a large amount of impurities, which leads to the pollution of the high-purity crystal, and the crystal is highly purified. The purification speed is slow, the efficiency is low, the yield is low, it is difficult to carry out continuously, which is not conducive to mechanized control, and it is difficult to apply to the mass production process

Method used

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  • Scattered metal continuous crystallization purification device and crystallization purification method
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  • Scattered metal continuous crystallization purification device and crystallization purification method

Examples

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Embodiment 1

[0047] The use of the present embodiment as above figure 1 The crystallization purification method of the shown continuous crystallization purification device for scattered metals (using two-stage cooling crystallization system in series), comprises the following steps:

[0048] (1) In the airtight protection box 25, pass into ultrahigh-purity argon;

[0049] (2) Apply a layer of high-purity gallium with a purity of 7N on the crystallization groove 5 of each rotary cooler 2, and make it cool and solidify and adsorb on the crystallization groove 5;

[0050] (3) Through each temperature control system, the temperature of the coolant in the cooling jacket 6 is controlled to be 10°C, the temperature of the crystallization tank 1 is controlled to 35°C, and the temperature of the remelting chute 14 is controlled to 45°C;

[0051] (4) Start the feeding system, add the gallium crystallization mother liquor with a purity of 4N, and when the volume of the gallium crystallization mother...

Embodiment 2

[0055] The use of the present embodiment as above figure 1 The crystallization purification method of the shown scattered metal continuous crystallization purification device (but adopts three-stage cooling crystallization system in series), comprises the following steps:

[0056] (1) In the airtight protection box 25, pass into ultrahigh-purity argon;

[0057] (2) Apply a layer of high-purity gallium with a purity of 7N on the crystallization groove 5 of each rotary cooler 2, and make it cool and solidify and adsorb on the crystallization groove 5;

[0058] (3) Through each temperature control system, the temperature of the coolant in the cooling jacket 6 is controlled to be 10°C, the temperature of the crystallization tank 1 is controlled to 35°C, and the temperature of the remelting chute 14 is controlled to 45°C;

[0059] (4) Start the feeding system, add the gallium crystallization mother liquor with a purity of 4N, and when the volume of the gallium crystallization moth...

Embodiment 3

[0063] The use of the present embodiment as above figure 1 The crystallization purification method of the shown continuous crystallization purification device for scattered metals (using two-stage cooling crystallization system in series), comprises the following steps:

[0064] (1) In the airtight protection box 25, pass into ultrahigh-purity argon;

[0065] (2) Apply a layer of high-purity indium with a purity of 6N on the crystallization groove 5 of each rotary cooler 2, and make it cool and solidify and adsorb on the crystallization groove 5;

[0066] (3) Through each temperature control system, the temperature of the coolant in the cooling jacket 6 is controlled to be 25°C, the temperature of the crystallization tank 1 is controlled to 180°C, and the temperature of the remelting chute 14 is controlled to 170°C;

[0067] (4) Start the feeding system, add the indium crystallization mother liquor with a purity of 4N, and when the volume of the indium crystallization mother ...

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Abstract

The invention discloses a scattered metal continuous crystallization purification device. The device comprises a cooling crystallization system, wherein the cooling crystallization system comprises a crystallization unit and a cooling unit, the crystallization unit comprises a crystallization tank and a rotary cooler, the rotary cooler comprises a rotary disc and a rotating shaft for driving the rotary disc to rotate, a crystallization groove is formed in the outer edge of the rotary disc, the lower portion of the rotary disc is immersed into the crystallization tank, and the cooling unit comprises a cooling sleeve arranged on the outer edge of the rotary disc and used for providing a crystallization environment for the outer edge of the rotary disc and a cooling liquid supply system used for providing cooling liquid for the interior of the cooling sleeve. The invention further provides a crystallization purification method using the scattered metal continuous crystallization purification device. The scattered metal continuous crystallization purification device is simple in structure, the crystallization purification method is convenient to use, and efficient and high-purity cooling crystallization purification of low-melting-point scattered metal can be achieved.

Description

technical field [0001] The invention belongs to the field of metal purification, and in particular relates to a crystallization purification device and a crystallization purification method. Background technique [0002] With the development of science and technology, the demand for high-purity metals is increasing. In particular, high-purity scattered metals play an irreplaceable role in the high-tech fields of modern equipment manufacturing such as chemical industry, solar photovoltaic, national defense, aerospace, signal image processing, catalysis, and automobile industry, and the market demand for scattered metals will further increase . [0003] At present, the high-purification preparation of scattered metals has become a hot spot for high-tech enterprises to deploy and the focus of research and development for the majority of scientific and technological personnel. Existing research on high-purification preparation of rare metals mainly focuses on equipment develop...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22B9/02C22B58/00
CPCC22B9/02C22B58/00Y02P10/20
Inventor 郭学益秦红于大伟田庆华张磊
Owner CENT SOUTH UNIV