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EEP solvent as well as impurity removal process and impurity removal system thereof

A solvent and process technology, applied in the field of EEP solvent and its impurity removal process and impurity removal system, can solve the problems of poor impurity removal effect of EEP solvent

Active Publication Date: 2021-04-16
BEIJING INST OF CHEM REAGENTS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the related art, the prepared EEP solvent is purified and removed through rectification steps, but the EEP solvent obtained through purification and removal of impurities can only reach the application level of industrial grade, that is, the effect of removing impurities on the EEP solvent is relatively low. Difference

Method used

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  • EEP solvent as well as impurity removal process and impurity removal system thereof
  • EEP solvent as well as impurity removal process and impurity removal system thereof
  • EEP solvent as well as impurity removal process and impurity removal system thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0063] Such as figure 1 As shown, this embodiment discloses an impurity removal system for an EEP solvent removal process, including a raw material tank 7, a molecular sieve adsorption column 2, a nanofiltration device 4, an ion resin exchange column 5, a rectification tower 6 and a finished product tank 12.

[0064] The raw material tank 7 is arranged above the molecular sieve adsorption column 2, and the molecular sieve adsorption column 2 is arranged vertically. The molecular sieve adsorption column 2 is filled with molecular sieves, and the filling height of the molecular sieve is 5 times of the column diameter of the molecular sieve adsorption column 2. The bottom of the raw material tank 7 is provided with a discharge port, and the side of the molecular sieve adsorption column 2 near its upper end is provided with a feed port, and the discharge port of the raw material tank 7 is connected with the feed port of the molecular sieve adsorption column 2 through a pipeline. ...

Embodiment 2

[0076] Such as figure 2 As shown, this embodiment discloses an impurity removal system for an EEP solvent removal process, including a raw material tank 7, an activated carbon adsorption column 1, a molecular sieve adsorption column 2, a nanofiltration device 4, an ion resin exchange column 5, and a fine Distillation tower 6 and product tank 12.

[0077] Raw material tank 7 is arranged on the top of activated carbon adsorption column 1, and activated carbon adsorption column 1 is vertically arranged, is filled with activated carbon in activated carbon adsorption column 1, and the packing height of activated carbon is 5 times of activated carbon adsorption column 1 column diameter. The bottom of the raw material tank 7 is provided with a discharge port, and the side of the activated carbon adsorption column 1 near its upper end is provided with a feed port, and the discharge port of the raw material tank 7 communicates with the feed port of the activated carbon adsorption colu...

Embodiment 3

[0092] Such as image 3 As shown, this embodiment discloses an impurity removal system for an EEP solvent removal process. The difference from Embodiment 2 is that a microfiltration device 3 is added between the molecular sieve adsorption column 2 and the nanofiltration device 4, as follows:

[0093] The microfiltration device 3 is arranged side by side on the side of the molecular sieve adsorption column 2, and the microfiltration device 3 is arranged vertically. The micron filter element is installed in the microfiltration device 3, and the pore size of the filter element is 0.1 micron. The first semi-finished product tank 9 is arranged between the microfiltration device 3 and the molecular sieve adsorption column 2, the first semi-finished product tank 9 is located at the side below the molecular sieve adsorption column 2 close to the microfiltration device 3, the first semi-finished product tank 9 passes through the pipeline and the molecular sieve adsorption column The ou...

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Abstract

The invention relates to the technical field of electronic chemicals, in particular to an EEP solvent and an impurity removal process and an impurity removal system thereof. The impurity removal process sequentially comprises the following steps: extracting an industrial-grade EEP solvent, and sequentially carrying out molecular sieve adsorption, nano-filtration, ion exchange and reactive distillation to obtain a finished product EEP solvent; an impurity removal system of the EEP solvent impurity removal process comprises a raw material tank, a molecular sieve adsorption column, a nano-filtration device, an ion resin exchange column, a rectifying tower and a finished product tank which are arranged in sequence. The EEP solvent obtained by the impurity removal method can be used for microelectronic production, and the impurity level is obviously reduced.

Description

technical field [0001] The invention relates to the technical field of electronic chemicals, more specifically, it relates to an EEP solvent and its impurity removal process and impurity removal system. Background technique [0002] With the continuous development of integrated circuit technology in my country, there is also a greater demand for chemical reagents used in integrated circuit technology. In the pre-process of integrated circuit technology, ultra-clean and high-purity reagents are required, mainly used for chip cleaning and etching, and also for chip doping and precipitation processes. Therefore, the purity of microelectronic chemical reagents has a certain impact higher requirements. [0003] At present, one of the main components in ultra-clean and high-purity reagents is ethyl 3-ethoxy propionate. Ethyl 3-ethoxypropionate, referred to as EEP, is a colorless liquid with a special fragrance, with a boiling point of 169-171°C and is non-toxic to the human body...

Claims

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Application Information

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IPC IPC(8): C07C67/56C07C67/48C07C67/60C07C67/54C07C69/708
CPCY02P20/10
Inventor 杨长青杨晓红
Owner BEIJING INST OF CHEM REAGENTS