Photoresist cleaning agent for semiconductor manufacturing process
A cleaning agent, semiconductor technology, applied in optics, optomechanical equipment, photosensitive material processing, etc., can solve the problems of poor dispersion of photoresist fine particles, easy re-aggregation of particles, easy to block pipes, etc., to avoid secondary aggregation. , excellent stability, the effect of increasing solubility
Pending Publication Date: 2021-04-23
福建省佑达环保材料有限公司
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Problems solved by technology
In the patent application number CN200580014563.5, a photoresist cleaning solution containing cyclic amine is mentioned to reduce corrosion and obtain excellent thermal stability. However, although increasing the cleaning temperature will improve the cleaning effect, it will also increase The speed of corrosion is difficult to adapt to the current more and more refined process requirements; and for example, the patent US6140027 proposes a photocatalyst made of alcohol amine compounds, organic solvents, water, organic phenol compounds, anti-corrosion agents and polyoxysilane surfactants. Anti-resist cleaning agent, which has poor dispersibility to the cleaned photoresist fine particles, and the particles are easy to gather again, forming secondary pollution and easy to block the pipeline
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[0029] Prepare the photoresist cleaning agent according to the formula in Table 1. The specific preparation method is to add deionized water into the stirring tank at room temperature, and then add alcohol amine compound, benzylamine compound, alcohol ether solvent, surface active agent, corrosion inhibitor, each material is put in and stirred for 5 minutes before adding the next material, stirred until clarified, and then filtered through two filter elements with a pore size of 2 μm and 0.5 μm in sequence.
[0030] Table 1 The dosage of each component in the water-based cleaning agent
[0031]
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The invention discloses a photoresist cleaning agent for a semiconductor manufacturing process. The photoresist cleaning agent comprises the following components: an alcohol amine compound, a benzylamine compound, an alcohol ether solvent, a surfactant, a corrosion inhibitor and deionized water. The photoresist cleaning agent is high in dissolving capacity for photoresist small molecules, high in removing efficiency, excellent in stability performance and capable of meeting the requirements of different process temperatures. Due to the excellent dispersity, secondary pollution caused by secondary aggregation of the cleaned small molecular photoresist is effectively avoided, and meanwhile, the corrosion rate of a bottom layer material is relatively low.
Description
technical field [0001] The invention belongs to the field of chemical cleaning in the semiconductor industry, and in particular relates to a photoresist cleaning agent used in the semiconductor manufacturing process. Background technique [0002] In the semiconductor manufacturing process, the photolithography process is the key link in the chip manufacturing process. The photoresist coating and vacuum exposure are carried out on the surface of the material in sequence. After the designed pattern is obtained after etching, the remaining photoresist needs to be removed. After dozens of photolithography processes, the plasma etching gas will form a cross-linked hardened product with the photoresist, and after the ashing process at more than 200 ° C, a surface-hardened photoresist residue will be formed. These photoresist residues Difficult to remove. In the patent application number CN200580014563.5, a photoresist cleaning solution containing cyclic amine is mentioned to redu...
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CPCG03F7/425
Inventor 刘小勇田博房龙翔叶鑫煌
Owner 福建省佑达环保材料有限公司