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A method for preparing surface-modified cerium oxide particles and polishing fluid containing the same

A surface modification, cerium oxide technology, applied in polishing compositions containing abrasives, chemical instruments and methods, other chemical processes, etc., can solve the problem of large surface roughness, workpiece surface damage, and easy agglomeration of cerium oxide abrasive particles problems, to achieve the effect of reducing agglomeration, improving dispersion performance, and small RMS roughness

Active Publication Date: 2022-05-10
上海晖研材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The problem to be solved by the present invention is that the existing cerium oxide abrasive grains are easy to agglomerate, resulting in damage to the surface of the workpiece after polishing, which is specifically manifested as the defect of large surface roughness after polishing, and a method for preparing surface-modified cerium oxide particles and The method of polishing liquid containing it

Method used

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  • A method for preparing surface-modified cerium oxide particles and polishing fluid containing the same
  • A method for preparing surface-modified cerium oxide particles and polishing fluid containing the same
  • A method for preparing surface-modified cerium oxide particles and polishing fluid containing the same

Examples

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Embodiment 1-20

[0056] The modifier shown in formula I, cerium oxide particles with a diameter of 20-50nm (D90), a polymer auxiliary and water are mixed, stirred and dispersed; then the pH value is adjusted with a dilute aqueous acetic acid solution (10% by mass) , and then stirred to obtain a cerium oxide dispersion. The above dispersion is reacted under heating. After the reaction is completed, centrifugal separation and drying are performed to finally obtain modified surface-modified cerium oxide particles. In the following examples, if the specific operating temperature is not limited, it is all carried out at room temperature (20-35° C.).

[0057] The types of raw material components of Examples 1-20 are shown in Table 1.

[0058] Table 1

[0059]

[0060]

[0061] Table 2 shows the content (mass percentage) of each raw material component of Examples 1-20 and the reaction conditions for preparing the surface-modified cerium oxide abrasive.

[0062] Table 2

[0063]

[0064]...

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Abstract

The invention discloses a method for preparing surface-modified cerium oxide particles and a polishing liquid containing the same. The preparation method of the surface-modified cerium oxide particles comprises the following steps, under the action of the modifying agent shown in formula I, the cerium oxide is modified to obtain the surface-modified cerium oxide particles. The modified cerium oxide particle prepared by the preparation method of the present invention can be used as the abrasive particle of the polishing liquid, which can selectively polish the silicon oxide film, and has small surface roughness after polishing.

Description

technical field [0001] The invention belongs to the technical field of abrasives for chemical mechanical polishing, and particularly relates to a method for preparing surface-modified cerium oxide particles and a polishing liquid containing the same. Background technique [0002] Cerium oxide has a long history as a polishing abrasive for precision glass polishing and VLSI silicon dioxide dielectric layer polishing. Because of its chemical reaction with silicon oxide, cerium oxide abrasive can react with silicon oxide under the same conditions. The polishing rate of silicon oxide is about three times that of silicon oxide, especially in neutral polishing liquid to maintain a high removal rate, and the polishing selection between silicon oxide and silicon nitride is relatively high. However, the polishing performance of nano-cerium oxide depends on its dispersion state. Like other nanoparticles, nano-cerium oxide is easy to agglomerate due to its extremely high surface energy...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09K3/14C09C1/00C09C3/12C09G1/02H01L21/311
CPCC09K3/1436C09C1/00C09C3/12C09G1/02H01L21/31111
Inventor 王溯蒋闯马丽寇浩东孙涛章玲然张德贺秦长春
Owner 上海晖研材料科技有限公司