Copper electroplating additive for high aspect ratio through hole of PCB and preparation method of copper electroplating additive
A through-hole electroplating and additive technology, which is applied in the manufacture of printed circuits, electrical components, printed circuits, etc., can solve the problems of low TP value of high-aspect ratio through-hole plating, difficult to uniform coating of high vertical and horizontal through-holes, etc., to achieve good Gloss, good throwing power, high toughness effect
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Embodiment 1
[0040] This embodiment provides a PCB high-aspect-ratio through-hole electroplating copper additive, which is composed of the following material ratios, and each liter of electroplating copper additive contains:
[0041]
[0042] The balance is deionized water.
[0043] Specifically, the brightener A in this embodiment is a compound of sodium polydithiodipropane sulfonate, mercaptan, sulfide, disulfide and polysulfide, wherein the brightener A is selected from the group comprising the following substances: 3 -(Benzothiazolyl-2-thio)-propylsulfonic acid, 3-mercaptopropane-1-sulfonic acid, ethylenedithiodipropylsulfonic acid, bis-(p-sulfophenyl)-di Thioether, bis-(ω-sulfobutyl)-disulfide, bis-(ω-sulfohydroxypropyl)-disulfide, bis-(ω-sulfopropyl)-disulfide; brightener B Sodium 3-mercapto-1-propanesulfonate, bis-(ω-sulfopropyl)-sulfide, methyl-(ω-sulfopropyl)-disulfide, methyl-(ω-sulfopropyl) -trisulfide, O-ethyl-dithiocarbonic acid-S-(ω-sulfopropyl) ester, thioglycolic acid,...
Embodiment 2
[0046] This embodiment provides a PCB high-aspect-ratio through-hole electroplating copper additive, which is composed of the following material ratios, and each liter of electroplating copper additive contains:
[0047]
[0048]
[0049] The balance is deionized water.
[0050] Brightener A, brightener B, carrier A, carrier B, leveling agent A, leveling agent B and the preparation method of electroplating copper solution in this embodiment, the electroplating method of PCB high aspect ratio through hole are all consistent with implementation Example 1 is the same, and the analysis and test results of the copper plating layer that the present embodiment obtains are as shown in Table 1.
Embodiment 3
[0052] This embodiment provides a PCB high-aspect-ratio through-hole electroplating copper additive, which is composed of the following material ratios, and each liter of electroplating copper additive contains:
[0053]
[0054] The balance is deionized water.
[0055] Brightener A, brightener B, carrier A, carrier B, leveling agent A, leveling agent B and the preparation method of electroplating copper solution in this embodiment, the electroplating method of PCB high aspect ratio through hole are all consistent with implementation Example 1 is the same, and the analysis and test results of the copper plating layer that the present embodiment obtains are as shown in Table 1.
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Abstract
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