Improved silicon source used for zeolite molecular sieve and prepared by enhanced dissolution method
A technology of zeolite molecular sieve and silicon source, applied in molecular sieves and alkali exchange compounds, chemical instruments and methods, crystalline aluminosilicate zeolites, etc., can solve the problem of increasing solvent consumption, energy consumption and processing costs, and poor stability of high-concentration solutions In order to achieve the effect of simple preparation method and high efficiency
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Embodiment 1
[0050] (1) Soak the dense silicon source pectate silicon soaked in the rod water, 38% concentrated hydrochloric acid or 68% concentrated nitric acid solution, soaking time is 12 hours.
[0051] (2) The mixture in (1) is grinded in a high energy ball mill, and the rotational speed is 1500R / min, the ball ratio 10: 1, the grinding time is 8 hours.
[0052] (3) The aqueous solution of methanol is formulated, and the potassium hydroxide is added to 14, and the silicon feedstock treated by step (2) is transferred to a water heat synthetic kettle, under temperature conditions of 180 ° C, in the base methanol The aqueous solution was dissolved for 5 hours.
[0053] (4) The formulated concentration ranges from 0.1 mol / L of potassium bromide aqueous solution, and mixed with silicon (3) under high strength agitation conditions under high strength stirring conditions.
[0054] (5) Spray the stabilized mixed solution prepared in (4) to spray the coating machine on the hot metal plate. The ...
Embodiment 2
[0057] Step (1) use 1 mol / L of more dilute hydrochloric acid or nitric acid, soaking on impurity removal on impurities within one day, the soaking time needs to be extended to 3 days. Other operations are the same as in Example 1 (2-5) or (2-6), and an approximate effect can also be obtained.
Embodiment 3
[0059] Step (5) The effect of using freeze-drying (-20 ° C overnight dry) is slightly in spray drying, and the silicon material is slightly agglomerated, but can be promoted in step (6).
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