Environment-friendly low-cost titanium-containing metal etching liquid composition and use method thereof

Abstract

The invention discloses an environment-friendly low-cost titanium-containing metal etching liquid composition and a using method thereof. The etching liquid comprises a main agent and an auxiliary agent, wherein the main agent comprises components of, in percentage by mass, 1%-20% of hydrogen peroxide, 1%-10% of strong oxidizing acid, 1%-10% of alkali compounds, 0.01%-5% of hydrogen peroxide stabilizer and 0.01%-2% of aminoazole compounds, and deionized water is used for supplementing the balance; and the auxiliary agent is prepared from the following components of, in percentage by mass, 1%-20% of strong oxidizing acid, 1%-20% of alkali compound, and 0.01%-2% of aminoazole compound, and deionized water is used for supplementing the balance. The etching liquid composition prepared by the method is free of fluorine and phosphorus, environment-friendly, low in waste liquid treatment cost and high in copper ion loading capacity, and metal obtained through etching has good etching morphology and can meet the production requirements of ultra-high-precision and small and medium-sized display products.

Description

technical field [0001] The invention relates to the field of metal surface chemical treatment, in particular to an environment-friendly and low-cost titanium-containing metal etching solution composition and a use method thereof. Background technique [0002] Etching is a technology that removes materials by chemical reaction or physical impact. It is mainly used to manufacture copper plates, zinc plates and other printing concave-convex plates, reduce weight instrument panels, and process electronic thin parts in aviation, machinery, and chemical industries. / Semiconductor and other precision etching products. [0003] Etching solution is a liquid that achieves the purpose of etching by eroding materials. At present, most of the commonly used etching solutions contain fluorine ions. Although the etching rate is improved, the etching accuracy cannot be guaranteed, and the loading capacity of the etching solution for metal ions is not high. The etching process produces a lar...

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Problems solved by technology

At present, most of the commonly used etching solutions contain fluorine ions. Although the etching rate is improved, the etching accuracy cannot be guaranteed, and the loading capacity of the etching solution for metal ions is not high. The etching process produces a large amount of etching solution, which increases the cost of the etching process. , can not meet the requirements of environmental friendliness

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