Heat dissipation device of power device gate region and manufacturing method
A technology for power devices and heat dissipation devices, applied in the field of heat dissipation devices, can solve the problems of transmission, large contact thermal resistance, unfavorable chip heat, etc.
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Embodiment 1
[0035] Such as Figure 1 to Figure 5 As shown in the first aspect of the present invention, a heat dissipation device for the gate region of a power device includes a silicon substrate 1, a flow channel layer assembly, a coolant and pin fins 8, and the flow channel layer assembly and the silicon substrate 1 are detachably connected. , the flow channel layer assembly and the silicon substrate 1 are provided with a power chip 7, the flow channel layer assembly is provided with a plurality of needle fins 8, and the silicon substrate 1 is provided with a first liquid inlet 4 and a first liquid outlet 5 , when working, the coolant enters the cavity formed after the connection between the silicon substrate 1 and the flow channel layer assembly through the first liquid inlet 4, and then passes through the pin fins 8 to make the power chip 7 on the silicon substrate 1 and the flow channel layer assembly The power chip 7 can quickly dissipate heat, and finally, the coolant flows out th...
Embodiment 2
[0059] A method for manufacturing a heat dissipation device for a gate region of a power device in this embodiment, using a heat dissipation device for a gate region of a power device as in Embodiment 1, includes the following steps:
[0060] Step 1. Double-sided polishing of the silicon wafer, followed by standard organic cleaning, acetone ultrasonication, isopropanol ultrasonication, deionized water ultrasonication, and nitrogen blow-drying;
[0061] Step 2. Design and process the photolithographic plate according to the pattern of pin fins 8, first use photoresist to spin coat, and then use a photolithography machine to perform photolithography;
[0062] Step 3, defining the needle fins 8 in the first flow channel layer 2 and the needle fins 8 in the second flow channel layer 3 by etching to form a coolant chamber and flow channel, and perform oxygen ion plasma treatment before etching, Then perform deep silicon etching;
[0063] Step 4, performing laser drilling on the fi...
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