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An atomic layer deposition device and deposition method suitable for powder samples

An atomic layer deposition and powder technology, applied in coating, metal material coating process, gaseous chemical plating, etc., can solve the problems of large powder loss, low coating rate, high cost, reduce coating cost and improve coating Efficiency, the effect of improving stability

Active Publication Date: 2022-02-22
NANKAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Low coverage due to powder agglomeration, etc.
[0009] (3) The existing powder coating technology has large powder loss, low output and high cost

Method used

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  • An atomic layer deposition device and deposition method suitable for powder samples
  • An atomic layer deposition device and deposition method suitable for powder samples
  • An atomic layer deposition device and deposition method suitable for powder samples

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Embodiment Construction

[0061] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the examples. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0062] Aiming at the problems existing in the prior art, the present invention provides an atomic layer deposition device and a deposition method suitable for powder samples. The present invention will be described in detail below with reference to the accompanying drawings.

[0063] Such as Figure 1 to Figure 3 As shown, the atomic layer deposition device suitable for powder samples provided by the embodiment of the present invention is provided with:

[0064] The two-stage heatable main chamber 1; the outside of the two-stage heatable main chamber 1 is connected with a mechanical rotating shaft 20 driven by a motor 15 o...

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Abstract

The invention belongs to the technical field of atomic layer deposition, and discloses an atomic layer deposition device and a deposition method suitable for powder samples. The atomic layer deposition device is provided with: a two-stage heatable main cavity; a two-stage heatable main cavity The outside of the chamber is connected with a mechanical rotating shaft and a vibrator driven by a motor or other means, and a flexible heatable gas pipeline is fixed at both ends of each stage of the two-stage heatable main chamber; The pipeline is externally connected with a pneumatic valve and a powder filter; the powder filter is connected with a heatable gas pipeline. The hourglass type atomic layer deposition equipment disclosed by the invention is suitable for experimental research and industrial-grade powder sample preparation. From the perspective of technology and equipment, it breaks through the efficiency and cost limitations of atomic layer deposition technology, and can realize a single milligram to ton level lithium battery. , Fuel cells, catalysts and other powder uniform coating.

Description

technical field [0001] The invention belongs to the technical field of atomic layer deposition, and in particular relates to an atomic layer deposition device and a deposition method suitable for powder samples. Background technique [0002] At present, powder coated coatings have been applied in energy fields such as lithium batteries, fuel cells, and catalysts. The surface coating modification of powders through ALD technology can improve their cycle and storage performance and prolong the service life of their products. [0003] When the traditional ALD equipment coats the powder, the first reaction chamber is always in the pumping state. After entering the chamber, the precursor is extracted before being adsorbed and saturated on the powder surface. It is suitable for coating a trace amount of powder on the surface, but The source of precursor is wasted, and the coverage rate is low. [0004] For the existing fluidized bed reaction chamber powder ALD equipment, the powd...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/455C23C16/34C23C16/52
CPCC23C16/45551C23C16/45536C23C16/34C23C16/52
Inventor 董红冯泽井美艺罗锋孙远东
Owner NANKAI UNIV
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