Method for realizing irreversible pressure induced SP3 hybridization increase of graphene based on transition metal catalysis
A technology of transition metal catalysis and transition metal, applied in the direction of single-layer graphene, graphite, diamond, etc., can solve the problems of unclear influence on the performance of diamond devices, complex experimental equipment, high cost, etc., and achieve rapid Gr irreversible pressure-induced sp3 impurities The effect of increased chemical efficiency, simple preparation process, and shortened operation time
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Embodiment 1
[0069] A transition-metal-catalyzed Gr irreversible piezo-induced sp 3 A method for increasing hybridization, the method includes: using a transition metal substrate as a catalyst, using a patterned substrate with an indenter pattern as a pressure application device, to achieve rapid, large-area, uniform, low-cost, single-layer Gr irreversible compression sp 3 Hybridization increases.
Embodiment 2
[0071] A Gr irreversible piezo-induced sp based on transition metal catalysis according to Example 1 3 The method of hybridization increase, the difference is: use transition metal Cu (transition metal substrate) as catalyst, patterned sapphire substrate with hemispherical indenter pattern as pressure application device, patterned sapphire substrate and Cu / Gr The size is about 5mm×5mm. like Figure 5 As shown, the specific steps are as follows:
[0072] (1) Preparation: preparation of Cu / Gr heterojunction; refers to: growing Gr on Cu substrate by metal-organic chemical vapor deposition method.
[0073] (2) Cleaning: Select a patterned sapphire substrate with a hardness of 9 (such as metal, semiconductor, etc.) and a hemispherical indenter pattern, Image 6 It is a schematic diagram of a SEM photo of a patterned sapphire substrate; and the patterned sapphire substrate is cleaned; cleaning refers to: the patterned sapphire substrate is ultrasonically cleaned for 15 minutes by ...
Embodiment 3
[0086] According to a method for preparing GNM by imprinting a patterned substrate according to Embodiment 2, the difference is that:
[0087] Step (1) refers to: using PMMA to wet transfer Gr to the substrate to prepare the substrate / Gr.
[0088] In step (4), the embossing method includes punching and rolling.
[0089] The number of layers of Gr is single layer or multilayer.
[0090] Periodic raised patterns are prepared by wet etching or dry etching.
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