Evaporation material control system and method

A material control system and material technology, applied in vacuum evaporation plating, metal material coating process, ion implantation plating, etc., can solve the problems of reducing equipment service life, reducing production efficiency, shortening running time, etc., and achieving increased operation time, increase productivity, and precisely control the effect of evaporation rate

Pending Publication Date: 2021-07-20
HUANENG NEW ENERGY CO LTD +1
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0004] In summary, when the power of the evaporation coating production line equipment in the prior art is adjusted, it cannot be adjusted according to the remaining amount of the evaporation element in the crucible, which will lead to the phenomenon that there is no evaporation source in the crucible and the phenomenon of overburning will reduce the service life of the equipment ; And because individual crucibles cannot be filled in time, the equipment can only be down for PM maintenance, loading materials and other operations, shortening the running time of Campaign and reducing production efficiency

Method used

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  • Evaporation material control system and method
  • Evaporation material control system and method

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Embodiment

[0028] The present invention provides an evaporation material control system. In this embodiment, the preparation of a light absorbing layer of a CIGS solar cell is taken as an example. The Cu, In, and Ga metal sources of the light-absorbing layer of CIGS solar cells are distributed on both sides according to certain rules, and there are 8-10 Se sources in the middle. Quartz Crystal Microbalances (Quartz Crystal Microbalance, QCM for short) are installed on the four corners of the evaporation chamber. ) was used to monitor the evaporation rate of the Se source in the chamber. In the actual production process, whether a production cycle ends is mainly determined by the remaining amount of the least crucible 6 in the Se source.

[0029] Such as figure 1 with figure 2 As shown, an evaporation material control system is provided in the embodiment of the present invention, including several crucibles 6, and each crucible 6 is used to hold evaporation materials; the bottom of eac...

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Abstract

The invention discloses an evaporation material control system and method. The system comprises a plurality of crucibles which are used for containing evaporation materials; pressure sensors are arranged at the bottoms of the crucibles, heating devices are arranged on the outer sides of the crucibles, the heating devices control the heating power through a control device, inner cavities of the crucibles communicate with material storage boxes through guide pipes, and valves are arranged on the guide pipes; the output ends of the pressure sensors are connected with the input end of a digital-to-analog converter, the output end of the digital-to-analog converter is connected with the input end of a data comparator and the input end of the control device, and the output end of the data comparator is connected with the input end of the control device; the data comparator is in data connection with a data memory with built-in comparison values; and the control device controls opening or closing of the valves. The evaporation source crucibles without the evaporation materials can be supplemented with the evaporation materials in time, the operation time of equipment is prolonged, and the productivity is improved.

Description

technical field [0001] The invention belongs to the field of vacuum evaporation coating, in particular to an evaporation material control system and method. Background technique [0002] Vacuum evaporation coating refers to heating and evaporating materials under vacuum conditions, so that the materials enter the gas phase migration in the state of molecules or atoms, and when they reach the surface of the workpiece to be plated, they condense to form a thin film. As the evaporation material in the crucible decreases, it is necessary to increase the heating power of the evaporation source to ensure a constant evaporation rate. The adjustment of the evaporation source power is mainly based on the difference between the detection data obtained from the detection and the target value (Target value). For example, the film thickness and rate monitor-QCM monitors whether the evaporation rate is within the Spec range. To adjust the power of different evaporation sources to achieve...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/54
CPCC23C14/24C23C14/542
Inventor 黄斌李梦洁赵东明冯笑丹赵志国秦校军李新连张赟熊继光董超夏渊
Owner HUANENG NEW ENERGY CO LTD
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