213nm laser

Abstract

The invention discloses a 213nm laser. The 213nm laser comprises a 1064nm laser, a frequency doubling crystal, a frequency quadruplicating crystal and a frequency quintupling crystal, wherein the 1064nm laser, the frequency doubling crystal, the frequency quadruplicating crystal and the frequency quintupling crystal are connected in sequence; the 1064nm laser is used for generating a 1064nm laser pulse; the frequency doubling crystal receives 1064nm laser pulses emitted by the 1064nm laser and is used for converting part of 1064nm laser into 532nm frequency doubling light; the frequency quadruplicating crystal is used for converting the 532nm frequency doubled light into 266nm laser pulse; and the frequency quintupling crystal is used for converting the 1064nm laser and the 266nm laser pulse into the 213nm laser. The 213nm laser can avoid the problem that polarization needs to be converted in the process of generating 213nm laser pulses by performing sum frequency on the frequency doubled light and the frequency tripled light.

Description

technical field [0001] The invention relates to the technical field of lasers, in particular to a 213nm laser. Background technique [0002] Ultraviolet wavelength light sources are widely used in the manufacture of semiconductor integrated circuits, and the shorter the wavelength of the light source, the higher the integration level of integrated circuits that can be supported. As the integration of semiconductor chips becomes higher and higher, the characteristic line width of plate making becomes thinner and thinner, and the wavelength of the photolithography light source required becomes shorter and shorter. [0003] At present, ArF excimer lasers are mainly used as photolithography light sources in industrial production, although ArF excimer lasers can output a deep ultraviolet wavelength of 193nm. However, the working medium of the excimer laser is toxic gas, which will pollute the environment, endanger personal safety, and have high equipment operation and maintenanc...

AI Technical Summary

Problems solved by technology

However, the working medium of excimer laser is toxic gas, which will pollute the environment and endanger personal safety, and the equipment operation and maintenance costs are high

At the same time, the output repetition frequency of the ArF excimer laser is low, which is not conducive to improving the processing efficiency. The output beam quality is poor and the line width is large, which is not conducive to improving the processing resolution.

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