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Hydrophobic antifriction self-lubricating carbon film based on low-temperature glow plasma and preparation method of hydrophobic antifriction self-lubricating carbon film

A plasma and self-lubricating technology, applied in solid diffusion coating, coating, gaseous chemical plating, etc., to achieve the effect of low preparation cost, uniform thickness and good bonding

Active Publication Date: 2021-08-17
ANHUI UNIVERSITY OF TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem of how to prepare a carbon film with hydrophobic and friction-reducing self-lubricating properties at low temperature at low temperature, and provides a hydrophobic and friction-reducing self-lubricating carbon film based on low-temperature glow plasma and its preparation method

Method used

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  • Hydrophobic antifriction self-lubricating carbon film based on low-temperature glow plasma and preparation method of hydrophobic antifriction self-lubricating carbon film
  • Hydrophobic antifriction self-lubricating carbon film based on low-temperature glow plasma and preparation method of hydrophobic antifriction self-lubricating carbon film
  • Hydrophobic antifriction self-lubricating carbon film based on low-temperature glow plasma and preparation method of hydrophobic antifriction self-lubricating carbon film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Step 1: Grind the M50NiL nitrided steel sample material with sandpaper, and further polish it to a low roughness state (mirror surface state is the best), and clean it in acetone or alcohol solution;

[0028] Step 2: Put the material obtained in step 1 in a plasma nitriding furnace, vacuumize to 50Pa, turn on the voltage, keep the voltage at 700V, and the duty cycle is 35%;

[0029] Step 3: Introduce propane and hydrogen at a ratio of 2:1, adjust the temperature in the furnace to 170°C and the air pressure to 55Pa, and start to prepare a hydrophobic, friction-reducing and self-lubricating carbon film;

[0030] Step 4: Keep the temperature at 170°C and the air pressure at 55 Pa for 5 hours, then cool the sample to room temperature with the furnace, and take out the sample.

[0031] The cross-sectional morphology of the obtained carbon film is as follows figure 1 As shown, it can be seen that the carbon film has a uniform thickness and is well combined with the substrate...

Embodiment 2

[0033] Step 1: Grind the M50NiL nitrided steel sample material with sandpaper, and further polish it to a low roughness state (mirror surface state is the best), and clean it in acetone or alcohol solution;

[0034] Step 2: Put the material obtained in step 1 in a plasma nitriding furnace, vacuumize to 50Pa, turn on the voltage, keep the voltage at 700V, and the duty cycle is 35%;

[0035] Step 3: Introduce propane and hydrogen at a ratio of 2:3, adjust the temperature in the furnace to 170°C and the air pressure to 55Pa, and start to prepare a hydrophobic, friction-reducing and self-lubricating carbon film;

[0036] Step 4: Keep the temperature at 170°C and the air pressure at 55 Pa for 5 hours, then cool the sample to room temperature with the furnace, and take out the sample.

[0037] The cross-sectional morphology of the obtained carbon film is as follows figure 2 As shown, it can be seen that the thickness of the carbon film is uniform, and the XPS test results of the c...

Embodiment 3

[0039] Step 1: Grind the 4140 steel sample material with sandpaper, and further polish to a low-roughness state (mirror state is the best), and clean it in acetone or alcohol solution;

[0040] Step 2: Put the material obtained in step 1 in a plasma nitriding furnace, evacuate to 50Pa, turn on the voltage, keep the voltage at 700V, and the duty cycle is 20%;

[0041] Step 3: Introduce propane and hydrogen at a ratio of 2:3, adjust the temperature in the furnace to 170°C and the air pressure to 55Pa, and start to prepare a hydrophobic, friction-reducing and self-lubricating carbon film;

[0042] Step 4: Keep the temperature at 170°C and the air pressure at 55 Pa for 5 hours, then cool the sample to room temperature with the furnace, and take out the sample.

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Abstract

The invention relates to the technical field of carbon film preparation, in particular to a hydrophobic antifriction self-lubricating carbon film based on low-temperature glow plasma and a preparation method of the hydrophobic antifriction self-lubricating carbon film. The preparation method comprises the following steps: polishing a material, placing the material in a plasma nitriding furnace, vacuumizing to 10-50 Pa, switching on the voltage, keeping the voltage at 600-800 V, and keeping the duty ratio at 30%-80%; and introducing carbon source gas and hydrogen / argon, adjusting the temperature and air pressure in the furnace, starting to prepare the hydrophobic antifriction self-lubricating carbon film, keeping stable parameters such as temperature and air pressure for a period of time, then cooling a sample to room temperature along with the furnace, and taking out the sample. According to the hydrophobic antifriction self-lubricating carbon film based on the low-temperature glow plasma and the preparation method of the hydrophobic antifriction self-lubricating carbon film, the problem of how to prepare the carbon film with hydrophobic and antifriction self-lubricating characteristics at low temperature at low cost is solved.

Description

technical field [0001] The invention relates to the technical field of carbon film preparation, in particular to a low-temperature glow plasma-based hydrophobic and friction-reducing self-lubricating carbon film and a preparation method thereof. Background technique [0002] The thin film of the material can provide the material with functional properties such as corrosion resistance, hydrophobicity, anti-friction and lubrication properties, and has a wide range of applications in the fields of electronic devices, mechanical vehicles, biomedical, aerospace and other fields. Traditional carbon film preparation methods include ion beam deposition, sputtering deposition, vacuum arc deposition, pulsed laser deposition and other physical vapor deposition methods, and the equipment and process costs are relatively high. Chemical vapor deposition generally requires higher temperatures to deposit thin films, which imposes limitations on the substrate material. The anti-friction and...

Claims

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Application Information

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IPC IPC(8): C23C16/26C23C16/02C23C8/38
CPCC23C16/26C23C8/38C23C16/02
Inventor 杨阳李杰王启民郑军赵栋才
Owner ANHUI UNIVERSITY OF TECHNOLOGY
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