First-order electro-optical effect silicon modulator and preparation process thereof
A technology of electro-optical effect and preparation process, applied in the directions of light guide, optics, instruments, etc., can solve the problems of weak plasma dispersion effect, large device size, low modulation efficiency, etc., and achieve the effect of improving bandwidth, reducing insertion loss and improving modulation efficiency.
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[0045] Please refer to figure 1 , figure 2 and image 3 This embodiment provides a preparation process of a first-order electro-optic effect silicon modulator 100, including:
[0046] The silicon waveguide region 110 is etched to form an amorphous silicon growth window 120, and the amorphous silicon growth window 120 is formed by etching of the upper surface of the silicon waveguide region 110.
[0047] The amorphous silicon 130 is deposited in the amorphous silicon growth window 120, and the silicon dioxide layer 140 is covered with the surface of the deposited amorphous silicon 130.
[0048] The light irradiation amorphous silicon growth window 120 with a wavelength of 488 nm converts at least a portion of the amorphous silicon 130 in the amorphous silicon growth window 120 into single crystal silicon.
[0049] In the preparation process of first-order electro-optic effect silicon modulator 100, since the light energy of irradiation light having a wavelength of 488 nm is transpar...
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