Extreme ultraviolet radiation control method and device, electronic device and extreme ultraviolet radiation system

Abstract

The invention relates to an extreme ultraviolet radiation control method and device, an electronic device and an extreme ultraviolet radiation system. The method comprises the following steps of outputting a liquid drop control instruction, wherein the liquid drop control instruction is used for controlling a liquid drop target generation device to generate liquid drops at a preset speed at a preset time interval; after the liquid drops reach a preset position, outputting a pre-pulse laser control instruction, wherein the pre-pulse laser control instruction is used for controlling a laser device to emit pre-pulse laser, so that the liquid drops generate cloud and mist clusters under the bombardment action of the pre-pulse laser; after the cloud and mist clusters reach the preset diffusion degree and the preset moving speed, outputting a main pulse laser control instruction, wherein the main pulse laser control instruction is used for controlling the same laser to emit main pulse laser, the cloud and mist clusters are made to generate plasma under the bombardment action of the main pulse laser, and the plasma is used for generating extreme ultraviolet radiation. By adopting the method provided by the embodiment of the invention, the plasma extreme ultraviolet radiation conversion efficiency can be effectively improved.

Description

technical field [0001] The present application relates to the field of laser technology, in particular to an extreme ultraviolet radiation control method, device, electronic equipment and extreme ultraviolet radiation system. Background technique [0002] Photolithography, as one of the core technologies in the semiconductor industry, is a patterning technology used in chip manufacturing. The light source used in lithography technology ranges from 436 nm to 356 nm, 248 nm, 193 nm... The line width required for lithography is getting smaller and smaller, and the wavelength of the light source is getting shorter and shorter. The wavelength range of light sources has evolved from the deep ultraviolet to the extreme ultraviolet range. [0003] At present, there are mainly four schemes to obtain extreme ultraviolet light sources, namely: synchrotron radiation source, laser plasma, discharge plasma and laser-assisted discharge plasma. Which solution to choose and how to use it t...

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Problems solved by technology

[0005]However, the pumping laser of the existing laser plasma light source is the laser light generated by the carbon dioxide laser, which needs to be transmitted in the air and reflected into the lithography light source system, and Two lasers are required to generate different pre-pulses and main pulses to heat the droplet target respectively, which is difficult to control, and it is difficult to increase the power of the light source, resulting in low plasma extreme ultraviolet radiation conversion efficiency

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