Multi-arc ion plating preparation method of AlTi target discharge AlTiN/AlN composite phase coating
A multi-arc ion plating and composite phase technology, applied in ion implantation plating, coating, metal material coating technology, etc., can solve the problem of low Al content in the coating
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- Publication Date
- 2021-08-31
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Figure 1
Abstract
Description
technical field
[0001] The invention discloses a multi-arc ion plating preparation method of an AlTi target discharge AlTiN / AlN composite phase coating, and relates to the field of vacuum coating. Background technique
[0002] AlTiN coating is developed on the basis of traditional TiN coating. TiN coating has the characteristics of high strength, high hardness, strong wear resistance and corrosion resistance, and is a hard coating material with excellent performance. However, the low high-temperature oxidation resistance of TiN coatings limits its application in the fields of high-speed cutting, dry cutting and high-temperature oxidation resistance. Therefore, based on the TiN coating, the AlTiN coating is formed by adding Al elements. Since Al element can form Al2O3 at high temperature, the high temperature oxidation resistance temperature of AlTiN coating is improved.
[0003] The higher the Al element content of the AlTiN coating, the better the high temperature oxidat...
Examples
specific Embodiment approach 1
[0032] Embodiment 1: This embodiment is a multi-arc ion plating preparation method of an AlTi target discharge AlTiN / AlN composite phase coating, which is completed according to the following steps:
[0033] The multi-arc ion plating preparation method of a kind of AlTi target discharge AlTiN / AlN composite phase coating described in the present invention, it comprises the following steps:
[0034] 1. Select AlTi alloy and Ti metal as the multi-arc ion plating target, adjust the anode position of the auxiliary gas vacuum arc discharge, clean the sample with ultrasonic alcohol for 10-60 minutes, take it out and dry it, and then put it on the turntable in the vacuum chamber. less than 5×10 -3 Pa;
[0035] 2. Perform bias plasma discharge bombardment cleaning on the samples in the vacuum chamber;
[0036] The cleaning time described in step 2 is 5 to 50 minutes;
[0037] 3. Turn on the heating device to heat the vacuum chamber to 200-550°C, feed the working gas into the vacuum ...
specific Embodiment approach 2
[0047] Specific embodiment 2: This embodiment further explains Embodiment 1. The element ratio of the AlTi alloy described in Step 1 is 67 / 33; the auxiliary gas vacuum arc discharge anode described in Step 1 is respectively located in front of the AlTi target and in the center of the vacuum chamber. on the base.
specific Embodiment approach 3
[0048] Embodiment 3: This embodiment further explains Embodiment 1. The bias plasma discharge bombardment cleaning described in step 2 includes workpiece glow cleaning, auxiliary gas vacuum arc discharge cleaning, and the electrode on the base in the center of the vacuum chamber as an auxiliary Anode for gas vacuum arc discharge.