Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Vacuum adsorption disc, polishing machine, polishing method, full-automatic polishing machine system and full-automatic polishing method

A technology of vacuum adsorption and adsorption disk, which is applied in the field of polishing, and can solve the problems of adsorption pad consumables, uneven force of adsorption glass, and high cost

Pending Publication Date: 2021-09-14
湖南永创机电设备有限公司
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But this device still has the following problems: 1, the vacuum adsorption tray is provided with an adsorption pad, and it is still difficult to take and place the sheet; 2, only by passing through a small amount of adsorption pores on the vacuum adsorption tray and the adsorption pad to adsorb glass, it is very easy to cause the adsorption of glass. 3. The holes on the adsorption pad must completely correspond to the vacuum holes, so it is very difficult to paste the adsorption pad; 4. The cost of the adsorption pad consumables is relatively high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vacuum adsorption disc, polishing machine, polishing method, full-automatic polishing machine system and full-automatic polishing method
  • Vacuum adsorption disc, polishing machine, polishing method, full-automatic polishing machine system and full-automatic polishing method
  • Vacuum adsorption disc, polishing machine, polishing method, full-automatic polishing machine system and full-automatic polishing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0064] Such as Figure 1-Figure 5 As shown, the vacuum suction disc that can be used for the polishing machine in this embodiment includes a first suction disc 105 and a second suction disc 106, both of which are hard materials, and the first suction disc 105 It fits closely with the second suction disk 106 and forms a half-closed suction vacuum chamber. The suction vacuum chamber includes the first suction chamber 104 inside the first suction disk 105 and the second suction chamber inside the second suction disk 106. 103, the outer side of the first adsorption plate 105 is set as a polishing piece adsorption surface 101, and the polishing piece adsorption surface 101 is uniformly arranged with adsorption holes 102, and the first adsorption chamber 104 is formed by connecting with each other with a plurality of uniformly arranged first adsorption air channels , and the first adsorption chamber 104 penetrates to the adsorption hole 102; the second adsorption chamber 103 is form...

Embodiment 2

[0101] The vacuum suction disk used in the polishing machine of this embodiment is the same as that of Embodiment 1.

[0102] Such as Figure 13 As shown, the polishing machine with the above-mentioned vacuum suction plate in this embodiment includes a polishing machine body 3, the polishing machine body 3 includes an upper fixed plate 302, and the vacuum adsorption plate is fixed on the upper fixed plate 302.

[0103] In this embodiment, the pressure regulating assembly 2 includes a main shaft 201 and an air pump 202 . The main shaft 201 is provided with a vacuum pipeline 203 .

[0104] In this embodiment, the main shaft 201 includes a first main shaft 2011 and a second main shaft 2012 that are sealed and connected to each other. The lower part of the first main shaft 2011 communicates with the air passage communication hole 108 through the vacuum suction chamber, and the second main shaft 2012 passes through the upper fixed plate 302 It is connected with the first main shaf...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
surface smoothnessaaaaaaaaaa
hardnessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a vacuum adsorption disc capable of being used for a polishing machine, the polishing machine with the vacuum adsorption disc, a polishing method for polishing a polishing piece, a full-automatic polishing machine system and a full-automatic polishing method using the full-automatic polishing machine system. According to the vacuum adsorption disc, the polishing machine, the polishing method, the full-automatic polishing machine system and the full-automatic polishing method, the polishing piece is adsorbed by adopting the vacuum adsorption disc, a polishing pad does not need to be adopted, feeding and discharging of the polishing piece are achieved through connection and disconnection of vacuum, an automatic feeding and discharging mechanical arm is adopted for grabbing materials, and a foundation is laid for achieving automation of glass polishing.

Description

technical field [0001] The invention belongs to the field of polishing processing equipment, and in particular relates to an adsorption device, a polishing machine, a polishing machine system and a polishing method. Background technique [0002] In order to make the glass surface smooth, the glass surface is usually polished, and the polishing machine is a mechanical device for polishing the glass. When the traditional polishing machine polishes the glass, the glass is adsorbed to the fixed plate through the adsorption pad. The loading and unloading of the glass in this polishing method can only be done manually. The manual operation is slow, and the easily damaged glass affects the yield rate. Touching the glass will affect the quality of the glass. More importantly, this polishing method cannot realize the automation of the polishing process, and the manual operation is heavy, and the work efficiency is difficult to guarantee. [0003] In view of the above-mentioned tradi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24B7/24B24B41/06B24B41/00
CPCB24B7/242B24B41/06B24B41/005
Inventor 李新良刘亚彪周继国杨友贵杨会义刘中文张雪祥
Owner 湖南永创机电设备有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com