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Water-containing photosensitive resin and photoresist dry film thereof

A photoresist and resin technology, which is applied in the field of photoresist dry film and photosensitive resin composition, can solve the problems of waste water discharge, product environmental protection grade discount, and volatile organic matter.

Pending Publication Date: 2021-09-21
江西惠美兴科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are a large amount of halogen-containing organic solvents in the production and use of solvent-based photoresist dry films. During the production and use of these organic solvents, organic compounds are likely to continue to volatilize, causing VOCs emission problems; at the same time, organic solvents in The dry film preparation and stripping process will not decompose or react by itself, and will eventually become liquid waste, causing wastewater discharge problems; finally, developed countries such as Europe, America and Japan vigorously advocate halogen-free, and a large amount of halogen in organic solvents will make the product The environmental protection level is greatly reduced, which will hinder the domestic photoresist dry film from entering the high-end product market

Method used

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Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment example 1

[0007] Synthesis of Water-Soluble Acrylic Resin

[0008] In the present invention, water-soluble acrylic resin is made by laboratory.

[0009] The present invention dissolves 2-ethylacrylic acid, ethyl methacrylate, propyl methacrylate and sec-butyl methacrylate in a certain amount of acetone according to the molar ratio of 1:1.05:1:1.10.

[0010] After the above mixture was heated to reflux temperature, a corresponding mass fraction of 2, 2´-azobis(isobutyronitrile) acetone solution was added dropwise.

[0011] The above molar ratio of 2, 2´-azobis(isobutyronitrile) to 2-ethylacrylic acid is 1.05:1.

[0012] After the 2,2´-azobis(isobutyronitrile)acetone solution was added dropwise, the reaction was refluxed for 5.5 h.

[0013] Quantities of other initiators are subsequently added.

[0014] The quantitative initiator is benzoyl peroxide.

[0015] The molar ratio of the above-mentioned quantitative benzoyl peroxide to 2-ethylacrylic acid is: 0.35:1.

[0016] After the abo...

specific Embodiment example 2

[0052] Synthesis of Water-Soluble Acrylic Resin

[0053] In the present invention, water-soluble acrylic resin is made by laboratory.

[0054] The present invention dissolves 2-ethylacrylic acid, ethyl methacrylate, propyl methacrylate and butyl acrylate in a certain amount of butanone according to the molar ratio of 1:1.05:1:1.10.

[0055] After the above mixture was heated to reflux temperature, the corresponding mass fraction of azobisisoheptanonitrile butanone solution was added dropwise.

[0056] The above molar ratio of azobisisoheptanonitrile to 2-ethylacrylic acid is 1.05:1.

[0057] After the dropwise addition of the azobisisoheptanonitrile butanone solution was completed, the reaction was refluxed for 5 h.

[0058] Quantities of other initiators are subsequently added.

[0059] The quantitative initiator is cumene hydroperoxide.

[0060] The molar ratio of the above-mentioned quantitative cumene hydroperoxide to 2-ethylacrylic acid is: 0.40:1.

[0061] After the c...

specific Embodiment example 3

[0088] Synthesis of Water-Soluble Acrylic Resin

[0089] In the present invention, water-soluble acrylic resin is made by laboratory.

[0090] The present invention dissolves 2-ethylacrylic acid, ethyl methacrylate, propyl methacrylate and isooctyl acrylate in a certain amount of butanone according to the molar ratio of 1:1.05:1:1.10.

[0091] After the above mixture was heated to reflux temperature, a corresponding mass fraction of 2, 2´-azobis(isobutyronitrile) acetone solution was added dropwise.

[0092] The above molar ratio of 2, 2´-azobis(isobutyronitrile) to 2-ethylacrylic acid is 1.05:1.

[0093] After the 2,2´-azobis(isobutyronitrile) butanone solution was added dropwise, the reaction was refluxed for 5 h.

[0094] Quantities of other initiators are subsequently added.

[0095] The quantitative initiator is tert-butyl hydroperoxide.

[0096] The molar ratio of the above-mentioned quantitative tert-butyl hydroperoxide to 2-ethylacrylic acid is: 0.4:1.

[0097] Af...

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Abstract

The invention discloses photosensitive resin containing water-soluble acrylate and a photoresist dry film thereof. The photoresist dry film mainly comprises the following raw materials: (1) water-soluble acrylic resin, (2) a photopolymerization compound, (3) a photoinitiator, (4) other auxiliary agents and the like. The resin can be used as a photoresist coating for dry film photoresist, and is finally applied to production of electronic components such as printed circuit boards and the like. The water-soluble acrylate is synthesized from 2-ethyl acrylic acid, ethyl methacrylate, propyl methacrylate, butyl acrylate methyl, sec-butyl acrylate, 2-ethylhexyl acrylate and the like according to a certain proportion. The photoresist dry film is excellent in resolution ratio, adhesive force performance and circuit size stability, and has wide application prospects in printed circuits and other electronic components.

Description

technical field [0001] The invention relates to a photosensitive resin composition and a photoresist dry film using it, in particular to a compound of a photosensitive resin with excellent resolution and water solubility and a photoresist dry film using it . Background technique [0002] With the rapid development of science and technology and the popularization of environmental protection knowledge, people's awareness of environmental protection has been greatly enhanced. There are a large amount of halogen-containing organic solvents in the production and use of solvent-based photoresist dry films. During the production and use of these organic solvents, organic compounds are likely to continue to volatilize, causing VOCs emission problems; at the same time, organic solvents in The dry film preparation and stripping process will not decompose or react by itself, and will eventually become liquid waste, causing wastewater discharge problems; finally, developed countries su...

Claims

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Application Information

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IPC IPC(8): G03F7/004G03F7/027C08F220/18C08F220/04
CPCG03F7/004G03F7/027C08F220/1802C08F220/04C08F220/1803C08F220/1804
Inventor 刘罡
Owner 江西惠美兴科技有限公司
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