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Transparent antenna preparation method based on film photoetching process and transparent antenna

A transparent and antenna technology, applied in the direction of radiating element structure, conductive pattern formation, etc., can solve the problems of operator health hazards, difficulty in achieving concealment, waste liquid pollution, etc. the effect

Active Publication Date: 2021-09-24
CHONGQING INST OF GREEN & INTELLIGENT TECH CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the above scheme can meet the performance requirements of the antenna, the whole operation process is time-consuming and costly, and the waste liquid pollutes the environment and produces toxic gas, which is harmful to the health of the operator. The width of the processing line is about 200 μm, and it is difficult to achieve good concealment. Effect

Method used

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  • Transparent antenna preparation method based on film photoetching process and transparent antenna
  • Transparent antenna preparation method based on film photoetching process and transparent antenna
  • Transparent antenna preparation method based on film photoetching process and transparent antenna

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Experimental program
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Effect test

Embodiment 1

[0041] This embodiment provides a method for preparing a transparent antenna based on a film lithography process, and the basic steps are as follows:

[0042] S1. Design of low visibility transparent antenna structure;

[0043] S2. Draw the low-visibility transparent antenna structure graph, and output the low-visibility transparent antenna structure graph on the film sheet to make a film mask;

[0044] S3. Cutting the transparent conductive film and the photosensitive dry film to a predetermined size and pre-processing;

[0045] S4. Paste the photosensitive dry film on the surface of the transparent conductive film, and expose the conductive film pasted with the photosensitive dry film;

[0046] S5. developing to expose the structural pattern of the transparent antenna;

[0047] S6. Etching out the shape of the transparent antenna by etching solution;

[0048] S7. removing the photosensitive dry film on the surface of the transparent conductive film and washing and drying ...

Embodiment 2

[0065] This embodiment provides a method for preparing a transparent antenna based on a film lithography process, and the basic steps are as follows:

[0066] S1. Design of low visibility transparent antenna structure;

[0067] S2. Output the low-visibility transparent antenna structure pattern onto the film sheet to make a film mask;

[0068] S3. Cutting the transparent conductive film and the photosensitive dry film to a predetermined size and pre-processing;

[0069] S4. Paste the photosensitive dry film on the surface of the transparent conductive film, and expose the conductive film pasted with the photosensitive dry film;

[0070] S5. developing to expose the structural pattern of the transparent antenna;

[0071] S6. Etching out the shape of the transparent antenna by etching solution;

[0072] S7. removing the photosensitive dry film on the surface of the transparent conductive film and washing and drying to obtain the required transparent conductive film;

[0073]...

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Abstract

The invention discloses a transparent antenna preparation method based on a film photoetching process and a transparent antenna. The method comprises the following steps: S1, designing a low-visibility transparent antenna structure; S2, patterning the low-visibility transparent antenna structure on a film to manufacture a film mask; S3, cutting the transparent conductive film and the photosensitive dry film according to a preset size, and performing pretreatment on the transparent conductive film and the photosensitive dry film; S4, pasting a photosensitive dry film on the surface of the transparent conductive film, and exposing the conductive film pasted with the photosensitive dry film; S5, developing to expose the structural pattern of the transparent antenna; S6, etching the shape of the transparent antenna through the etching liquid; S7, removing the photosensitive dry film on the surface of the transparent conductive film, cleaning and drying to obtain the required transparent conductive film; S8, pasting the obtained transparent conductive film on a transparent plate; S9, cutting the transparent plate to obtain the required transparent antenna, and S10, connecting the transparent antenna to a radio frequency connector or a radio frequency cable. The method is high in machining precision and can be expanded to large-area preparation, the appearance of the manufactured antenna is not easy to perceive, and the antenna has the low-visibility characteristic.

Description

technical field [0001] The invention relates to the technical field of transparent antennas, in particular to a method for preparing a transparent antenna based on a film photolithography process and the transparent antenna. Background technique [0002] As a component capable of transmitting and receiving electromagnetic waves, the antenna plays an important role in the wireless communication system. In recent years, with the continuous development of wireless communication technology, people's requirements for wireless communication technology have also been continuously improved. Therefore, the antenna It has attracted more and more people's attention, and the research on antennas is also deepening. On some special vehicles or ships, huge antennas not only affect the appearance visually, but also are not conducive to safety and concealment in the actual environment. Due to the transparent conductive The film has the characteristics of light transparency and conductivity, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01Q1/38H05K3/12
CPCH01Q1/38H05K3/12Y02P70/50
Inventor 胡承刚程晋广史浩飞张恒邵丽周萌王刚
Owner CHONGQING INST OF GREEN & INTELLIGENT TECH CHINESE ACADEMY OF SCI
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