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Patterning method of nanowire electrode

A nanowire and patterning technology, applied in circuits, electrical components, electrical solid devices, etc., can solve the problems of nanowire electrode edge damage, reduce the accuracy of patterned electrodes, etc., to achieve flexible processing, good edge quality, and maintain integrity. Effect

Pending Publication Date: 2021-10-26
CENT SOUTH UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

When the template-assisted coating technology is released from the mold, the template will cause damage to the edge of the nanowire electrode, reducing the accuracy of the patterned electrode

Method used

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  • Patterning method of nanowire electrode
  • Patterning method of nanowire electrode
  • Patterning method of nanowire electrode

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Embodiment Construction

[0022] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. For simplicity of illustration, the methods are depicted or described as a series of operations and are neither intended to be exhaustive nor to place limitations on the order of experimental operations. For example, experimental procedures may be performed in various orders and / or concurrently, and include other experimental procedures not described at this time.

[0023] see figure 1 , the method for high-precision patterned nanowire electrodes provided by the present invention comprises the following steps:

[0024] (1) A thin flexible mask is covered on a flexible substrate, and a laser cutting...

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Abstract

The invention provides a patterning method of a nanowire electrode, which comprises the following steps of: covering a flexible substrate with a thin flexible film, and processing the covered flexible film into a required pattern structure in a laser cutting mode to form a mask; treating the exposed flexible substrate by adopting oxygen plasma to enable the exposed hydrophobic flexible substrate to be hydrophilic; removing the flexible mask, coating the surface of the flexible substrate with the nanowire suspension liquid, and selectively coating the hydrophilic area of the substrate with the nanowire suspension liquid; and finally, improving the conductivity of the nanowire electrode through heating and annealing treatment. According to the method, the nanowire is selectively coated in a wetting auxiliary mode, so that the nanowire can be fully utilized, the integrity of the nanowire is kept, and a refined and low-resistance nanowire electrode is obtained.

Description

technical field [0001] The invention relates to the field of flexible transparent electrodes, in particular to a method for patterning nanowire electrodes. Background technique [0002] In recent years, transparent conductive films have been widely used in electronic devices such as touch screens, display panels, solar cells, and wearable devices. Currently, the most commonly used transparent conductive material on the market is indium tin oxide (IT0). The square resistance of ITO glass is usually 10-100Ω / sq, the visible light transmittance is about 90%, and it has high-quality photoelectric performance. However, with the development of optoelectronic device technology towards flexibility, brittle ITO transparent conductive films can no longer meet the application requirements of flexible devices. In addition, the annealing temperature of ITO production is as high as 300 °C, which is also not conducive to its application on flexible heat-sensitive substrates. Therefore, in...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B13/00H01L51/56H01L51/52
CPCH01B13/00H10K50/805H10K71/00
Inventor 胡友旺梁昶孙小燕段吉安孔德键
Owner CENT SOUTH UNIV