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Solar cell borosilicate glass passivation method

A solar cell and solar cell technology, applied in the field of solar cells, can solve the problems of high process cost, discomfort, complex process, etc., and achieve the effects of reducing process steps, ensuring efficiency, and reducing production costs

Inactive Publication Date: 2021-11-12
江苏润阳悦达光伏科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Based on the existing method of passivating solar cells with hot oxygen or wet oxygen, there are problems such as complicated process and high process cost, which are not suitable for mass production. The present invention provides a new method for passivating solar cells with borosilicate glass , the passivation method of the present invention ensures the efficiency of battery products while reducing process steps, and reduces the cost of battery production

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] A solar cell borosilicate glass passivation method, comprising the steps of:

[0034] S1, adopt the process of alkali etching to carry out surface treatment to the solar cell sheet, remove various organic matter, damage layer, impurity on the surface of the solar cell sheet, form an effective suede structure (can be carried out by using sodium hydroxide or potassium hydroxide solution Alkali etching);

[0035] S2. By controlling the thermal diffusion process, a borosilicate glass layer with a thickness of 120 nm is formed on the solar battery sheet forming the textured structure;

[0036] S3. Then use hydrofluoric acid with a concentration of 3.8wt% to etch away part of the borosilicate glass layer, leaving a borosilicate glass layer with a thickness of 15nm, that is, passivation is completed. In this step, the hydrofluoric acid etching time is 8 minutes. The solar cell after passivation in Example 1 is recorded as BSG-15nm.

[0037] Preferably, the thermal diffusion ...

Embodiment 2

[0045] A solar cell borosilicate glass passivation method, comprising the steps of:

[0046] S1, adopt the process of alkali etching to carry out surface treatment to the solar cell sheet, remove various organic matter, damage layer, impurity on the surface of the solar cell sheet, form an effective suede structure (can be carried out by using sodium hydroxide or potassium hydroxide solution Alkali etching);

[0047] S2. By controlling the thermal diffusion process, a layer of borosilicate glass layer with a thickness of 80 nm is formed on the solar battery sheet forming the textured structure;

[0048]S3. Then use hydrofluoric acid with a concentration of 3.8wt% to etch away part of the borosilicate glass layer, leaving a borosilicate glass layer with a thickness of 10 nm, that is, passivation is completed. In this step, the hydrofluoric acid etching time is 10 minutes. The solar cell after passivation in Example 2 is recorded as BSG-10nm.

[0049] Preferably, the thermal d...

Embodiment 3

[0057] A solar cell borosilicate glass passivation method, comprising the steps of:

[0058] S1, adopt the process of alkali etching to carry out surface treatment to the solar cell sheet, remove various organic matter, damage layer, impurity on the surface of the solar cell sheet, form an effective suede structure (can be carried out by using sodium hydroxide or potassium hydroxide solution Alkali etching);

[0059] S2. By controlling the thermal diffusion process, a borosilicate glass layer with a thickness of 100 nm is formed on the solar battery sheet forming the textured structure;

[0060] S3. Then use hydrofluoric acid with a concentration of 3.8wt% to etch away part of the borosilicate glass layer, leaving a borosilicate glass layer with a thickness of 25nm to complete passivation. In this step, the hydrofluoric acid etching time is 5 minutes. The solar cell after passivation in Example 3 is recorded as BSG-25nm.

[0061] Preferably, the thermal diffusion process in ...

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Abstract

The invention discloses a solar cell borosilicate glass passivation method. The method comprises the following steps: S1, carrying out surface treatment on a solar cell to form an effective textured structure; S2, generating a borosilicate glass layer with the thickness of 80-120nm on the solar cell with the textured structure through a thermal diffusion process; and S3, corroding off a part of the borosilicate glass layer by using a low-concentration hydrofluoric acid, and reserving the borosilicate glass layer with the thickness of 10-25nm, and completing passivation. According to the passivation method disclosed by the invention, the borosilicate glass dielectric layer with the thickness of 10-25nm is reserved, and the dielectric layer has a passivation effect similar to that of silicon oxide so that the efficiency of the cell can be well improved; and after the borosilicate glass layer of a conventional N-type cell is completely removed, a silicon oxide passivation layer is generally generated on the front surface of the conventional N-type cell in a hot oxygen or wet oxygen mode, and the passivation method cancels the step and directly adopts the borosilicate glass layer formed by diffusion for passivation so that the efficiency of a cell product is ensured while the process steps are reduced, and the manufacturing cost of the cell is also decreased.

Description

technical field [0001] The present invention relates to the technical field of solar cells, in particular to a solar cell borosilicate glass passivation method; the solar cells involved in the present invention are mainly N-type cells. Background technique [0002] Such as figure 1 As shown, in the manufacturing process of N-type solar cells, it is necessary to diffuse the boron source on one side of the cell 1 to form the P / N junction 2 in the core area of ​​the cell. A layer of borosilicate glass 3 with a certain thickness grows on the surface; but this layer of borosilicate glass 3 is mainly a silicon dioxide layer rich in boron, which contains a lot of impurities, which will affect the efficiency of the battery. In order to ensure the overall quality of the battery, This layer of borosilicate glass 3 is generally etched away. [0003] After removing the borosilicate glass layer, conventional N-type cells usually use thermal oxygen (or wet oxygen) to generate a silicon ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L31/0216
CPCH01L31/1804H01L31/1868H01L31/02167Y02E10/547Y02P70/50
Inventor 张双玉张满满乐雄英陆祥
Owner 江苏润阳悦达光伏科技有限公司