Solar cell borosilicate glass passivation method
A solar cell and solar cell technology, applied in the field of solar cells, can solve the problems of high process cost, discomfort, complex process, etc., and achieve the effects of reducing process steps, ensuring efficiency, and reducing production costs
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Embodiment 1
[0033] A solar cell borosilicate glass passivation method, comprising the steps of:
[0034] S1, adopt the process of alkali etching to carry out surface treatment to the solar cell sheet, remove various organic matter, damage layer, impurity on the surface of the solar cell sheet, form an effective suede structure (can be carried out by using sodium hydroxide or potassium hydroxide solution Alkali etching);
[0035] S2. By controlling the thermal diffusion process, a borosilicate glass layer with a thickness of 120 nm is formed on the solar battery sheet forming the textured structure;
[0036] S3. Then use hydrofluoric acid with a concentration of 3.8wt% to etch away part of the borosilicate glass layer, leaving a borosilicate glass layer with a thickness of 15nm, that is, passivation is completed. In this step, the hydrofluoric acid etching time is 8 minutes. The solar cell after passivation in Example 1 is recorded as BSG-15nm.
[0037] Preferably, the thermal diffusion ...
Embodiment 2
[0045] A solar cell borosilicate glass passivation method, comprising the steps of:
[0046] S1, adopt the process of alkali etching to carry out surface treatment to the solar cell sheet, remove various organic matter, damage layer, impurity on the surface of the solar cell sheet, form an effective suede structure (can be carried out by using sodium hydroxide or potassium hydroxide solution Alkali etching);
[0047] S2. By controlling the thermal diffusion process, a layer of borosilicate glass layer with a thickness of 80 nm is formed on the solar battery sheet forming the textured structure;
[0048]S3. Then use hydrofluoric acid with a concentration of 3.8wt% to etch away part of the borosilicate glass layer, leaving a borosilicate glass layer with a thickness of 10 nm, that is, passivation is completed. In this step, the hydrofluoric acid etching time is 10 minutes. The solar cell after passivation in Example 2 is recorded as BSG-10nm.
[0049] Preferably, the thermal d...
Embodiment 3
[0057] A solar cell borosilicate glass passivation method, comprising the steps of:
[0058] S1, adopt the process of alkali etching to carry out surface treatment to the solar cell sheet, remove various organic matter, damage layer, impurity on the surface of the solar cell sheet, form an effective suede structure (can be carried out by using sodium hydroxide or potassium hydroxide solution Alkali etching);
[0059] S2. By controlling the thermal diffusion process, a borosilicate glass layer with a thickness of 100 nm is formed on the solar battery sheet forming the textured structure;
[0060] S3. Then use hydrofluoric acid with a concentration of 3.8wt% to etch away part of the borosilicate glass layer, leaving a borosilicate glass layer with a thickness of 25nm to complete passivation. In this step, the hydrofluoric acid etching time is 5 minutes. The solar cell after passivation in Example 3 is recorded as BSG-25nm.
[0061] Preferably, the thermal diffusion process in ...
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