Recovery system and method for tail gas generated during polycrystalline silicon production

A tail gas recovery and polysilicon technology, applied in separation methods, chemical instruments and methods, gas treatment, etc., can solve the problems of poor heat transfer effect, poor heat transfer effect of heat exchange tubes, impurities, etc., achieve good thermal conductivity, increase effect of effect

CN113786706APending Publication Date: 2021-12-14SICHUAN JIUYUAN MACHINERY MFG
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Publication Date
2021-12-14

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Abstract

The invention relates to a recovery system for tail gas generated during polycrystalline silicon production. The recovery system comprises a barrel, a ventilation assembly and a heat exchange assembly, wherein the ventilation assembly and the heat exchange assembly are arranged in the barrel; the part, close to the heat exchange assembly, in the barrel is filled with activated carbon; the ventilation assembly is used for introducing hydrogen into the barrel and recycling hydrogen; the heat exchange assembly is used for heat exchange of the activated carbon; and the heat exchange assembly comprises a heat exchange pipe, the heat exchange pipe comprises an outer sleeve and an inner pipe arranged in the outer sleeve, one end of the outer sleeve is sealed, the outer wall of the inner pipe is connected with the inner wall, away from the sealed end, of the outer sleeve in a sealed mode, and a plurality of fin plates are arranged on the outer wall of the outer sleeve. According to the system, the influence of liquid having been subjected to heat exchange on heat exchange is greatly reduced, the heat exchange effect of the activated carbon is effectively improved, the heat exchange effect is more uniform, and high-purity hydrogen is obtained in the recovery system for tail gas generated during polycrystalline silicon production.
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Description

technical field

[0001] The invention relates to the technical field of polysilicon production, in particular to a tail gas recovery system and method for polysilicon production. Background technique

[0002] Polycrystalline silicon is a form of simple silicon, the direct raw material for the production of single crystal silicon, and the electronic information basic material for semiconductor devices such as contemporary artificial intelligence, automatic control, information processing, and photoelectric conversion. In the process of polysilicon production, hydrogen tail gas containing impurities will be generated, and activated carbon is usually used to adsorb and purify hydrogen.

[0003] In the current industry, activated carbon adsorption technology is generally used to purify hydrogen. The principle of pressure swing adsorption is to use the characteristics of activated carbon and other adsorbents that the adsorption capacity of gas varies with pressure. Make it separa...

Examples

Embodiment 1

[0044] Embodiment one: see Figure 1-8 as shown,

[0045] A polysilicon production tail gas recovery system provided in this embodiment includes a cylinder body 31 and a ventilation assembly 32 and a heat exchange assembly 33 arranged in the cylinder body 31;

[0046] The part of the cylinder 31 close to the heat exchange component 33 is filled with activated carbon, the ventilation component 32 is used for the introduction of hydrogen in the cylinder 31 and the recovery of hydrogen, and the heat exchange component 33 is used for the The heat exchange of activated carbon;

[0047] The heat exchange assembly 33 includes a heat exchange tube 34, the heat exchange tube 34 includes an outer tube 35 and an inner tube 36 arranged in the outer tube 35, one end of the outer tube 35 is sealed, and the inner tube 36 The outer wall of the outer sleeve 35 is sealed and connected to the inner wall away from the sealing end, and the outer wall of the outer sleeve 35 is provided with an op...

Embodiment 2

[0052] Embodiment two: see Figure 1-8 as shown,

[0053] The difference between this embodiment and Embodiment 1 is that: the heat exchange assembly 33 includes a water inlet device 318; the water inlet device 318 includes a water inlet pipe 319 and several water inlet ring pipes 320, and the water inlet pipe 319 A water ring pipe 320 , the water inlet ring pipe 320 is provided with several water inlet branch pipes 321 , and the water inlet branch pipes 321 are sealingly connected with the opening of the outer casing 35 . The water inlet pipe 319 is connected to several water inlet ring pipes 320, and several water inlet branch pipes 321 arranged on the water inlet ring pipe 320 are sealed and connected with the opening of the outer casing 35, and high-temperature / low-temperature liquid is injected through the water inlet pipe 319, so that the liquid enters the water inlet ring In the pipe 320, and as the water inlet branch pipe 321 enters the heat exchange tube 34 from the ...

Embodiment 3

[0056] Embodiment three: see Figure 9 as shown,

[0057] A method for recovering tail gas from polysilicon production provided in this embodiment includes the following steps:

[0058] Cooling step: pass low-temperature liquid into the heat exchange tube 34, and pass low-temperature liquid / gas into the jacket 38, and the activated carbon in the cylinder 31 is in a low-temperature state;

[0059] Purification step: feed hydrogen tail gas into the hydrogen inlet pipe 311, the hydrogen tail gas passes through the activated carbon, the activated carbon removes impurity components in the hydrogen tail gas, and the purified hydrogen is discharged from the hydrogen outlet pipe 315;

[0060] Heating step: passing high-temperature liquid into the heat exchange tube 34, passing high-temperature liquid / gas into the jacket 38, and the activated carbon is in a high-temperature state;

[0061] Activated carbon regeneration step: feed hydrogen tail gas into the hydrogen inlet pipe 311, the ...